View source for MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V. (20240284805). METHOD FOR PRODUCING A SOLID-STATE COMPONENT, SOLID-STATE COMPONENT, QUANTUM COMPONENT AND APPARATUS FOR PRODUCING A SOLID-STATE COMPONENT simplified abstract

=METHOD FOR PRODUCING A SOLID-STATE COMPONENT, SOLID-STATE COMPONENT, QUANTUM COMPONENT AND APPARATUS FOR PRODUCING A SOLID-STATE COMPONENT=


==Organization Name==

[[:Category:MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V.|MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V.]]


[[Category:MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V.]]

==Inventor(s)==

[[:Category:Johannes Boschker of Stuttgart (DE)|Johannes Boschker of Stuttgart (DE)]][[Category:Johannes Boschker of Stuttgart (DE)]]

[[:Category:Wolfgang Braun of Bietigheim-Bissingen (DE)|Wolfgang Braun of Bietigheim-Bissingen (DE)]][[Category:Wolfgang Braun of Bietigheim-Bissingen (DE)]]

[[:Category:Jochen Mannhart of Böblingen (DE)|Jochen Mannhart of Böblingen (DE)]][[Category:Jochen Mannhart of Böblingen (DE)]]

==METHOD FOR PRODUCING A SOLID-STATE COMPONENT, SOLID-STATE COMPONENT, QUANTUM COMPONENT AND APPARATUS FOR PRODUCING A SOLID-STATE COMPONENT - A simplified explanation of the abstract==


This abstract first appeared for US patent application 20240284805 titled 'METHOD FOR PRODUCING A SOLID-STATE COMPONENT, SOLID-STATE COMPONENT, QUANTUM COMPONENT AND APPARATUS FOR PRODUCING A SOLID-STATE COMPONENT

The invention pertains to a method of creating a solid-state component, specifically for a quantum component like a qubit, with one or more thin films made of a first material. These films have a thickness ranging from a monolayer to 100 nm and are deposited on a substrate surface in a reaction chamber sealed from the ambient atmosphere. Additionally, the invention covers a solid-state component for a quantum component, comprising thin films of a first material with a thickness between a monolayer and 100 nm deposited on a substrate surface. Furthermore, it includes a quantum component incorporating this solid-state component and an apparatus for producing such a component.

* Thin films made of a first material with a thickness between a monolayer and 100 nm are used in the production of solid-state components.
* The production process takes place in a reaction chamber sealed from the ambient atmosphere.
* The solid-state component is designed for quantum applications, particularly qubits.
* The invention offers a method to create precise and controlled thin films for quantum components.
* The technology enables the development of advanced quantum components with improved performance and stability.

Potential Applications:
- Quantum computing
- Quantum information processing
- Quantum communication systems

Problems Solved:
- Precise deposition of thin films for quantum components
- Enhanced performance and stability of quantum components

Benefits:
- Improved efficiency and reliability of quantum components
- Advancement in quantum technology and applications

Commercial Applications:
Title: Advanced Quantum Components for Next-Generation Technologies
This technology can be utilized in industries such as:
- Information technology
- Telecommunications
- Defense and security

Questions about Quantum Components:
1. How does the thickness of the thin films impact the performance of the quantum component?
2. What are the potential challenges in scaling up the production of these solid-state components for commercial use?


==Original Abstract Submitted==

the invention relates to a method of producing a solid-state component, in particular for a quantum component, preferably for a qubit, comprising one or more thin films, the one or more thin films comprising a first material and each said film having a thickness selected between a monolayer and 100 nm and is deposited onto a substrate surface of a substrate, wherein the production process is carried out in a reaction chamber sealed with respect to the ambient atmosphere. further, the invention relates to a solid-state component, in particular for a quantum component, preferably for a qubit, comprising one or more thin films, one of the one or more thin films comprises a first material with a thickness between a monolayer and 100 nm and is deposited onto a substrate surface of a substrate. in addition, the invention relates to a quantum component comprising such a solid-state component according to the present invention and to an apparatus for producing such a solid-state component according to the present invention.



[[Category:H10N60/01]]
[[Category:CPC_H10N60/0156]]