View source for INSTITUTE OF CROP SCIENCES, CHINESE ACADEMY OF AGRICULTURAL SCIENCES (20240218459). MOLECULAR MARKERS OF PHOTO-SENSITIVITY MODULE RELATED TO RICE BLAST RESISTANCE AND THEIR APPLICATIONS simplified abstract

=MOLECULAR MARKERS OF PHOTO-SENSITIVITY MODULE RELATED TO RICE BLAST RESISTANCE AND THEIR APPLICATIONS=


==Organization Name==

[[:Category:INSTITUTE OF CROP SCIENCES, CHINESE ACADEMY OF AGRICULTURAL SCIENCES|INSTITUTE OF CROP SCIENCES, CHINESE ACADEMY OF AGRICULTURAL SCIENCES]]


[[Category:INSTITUTE OF CROP SCIENCES, CHINESE ACADEMY OF AGRICULTURAL SCIENCES]]

==Inventor(s)==

[[:Category:Tianqing Zheng of Beijing (CN)|Tianqing Zheng of Beijing (CN)]][[Category:Tianqing Zheng of Beijing (CN)]]

[[:Category:Yuanbao Lei of Beijing (CN)|Yuanbao Lei of Beijing (CN)]][[Category:Yuanbao Lei of Beijing (CN)]]

[[:Category:Jianlong Xu of Beijing (CN)|Jianlong Xu of Beijing (CN)]][[Category:Jianlong Xu of Beijing (CN)]]

[[:Category:Ziqi Zhou of Beijing (CN)|Ziqi Zhou of Beijing (CN)]][[Category:Ziqi Zhou of Beijing (CN)]]

[[:Category:Linyun Xu of Beijing (CN)|Linyun Xu of Beijing (CN)]][[Category:Linyun Xu of Beijing (CN)]]

[[:Category:Dechen Yang of Beijing (CN)|Dechen Yang of Beijing (CN)]][[Category:Dechen Yang of Beijing (CN)]]

[[:Category:Xiuyun Lin of Beijing (CN)|Xiuyun Lin of Beijing (CN)]][[Category:Xiuyun Lin of Beijing (CN)]]

[[:Category:Faruquee Muhiuddin of Beijing (CN)|Faruquee Muhiuddin of Beijing (CN)]][[Category:Faruquee Muhiuddin of Beijing (CN)]]

[[:Category:Xiuqin Zhao of Beijing (CN)|Xiuqin Zhao of Beijing (CN)]][[Category:Xiuqin Zhao of Beijing (CN)]]

==MOLECULAR MARKERS OF PHOTO-SENSITIVITY MODULE RELATED TO RICE BLAST RESISTANCE AND THEIR APPLICATIONS - A simplified explanation of the abstract==


This abstract first appeared for US patent application 20240218459 titled 'MOLECULAR MARKERS OF PHOTO-SENSITIVITY MODULE RELATED TO RICE BLAST RESISTANCE AND THEIR APPLICATIONS

The invention described in this patent application involves genetic analysis and the development of a marker set for a photo-sensitivity module related to transgressive photo-sensitivity (TPS) in rice blast resistance breeding.

* Genetic analysis was conducted using bi-parental RIL populations derived from TPS crosses with a donor parent to map the photo-sensitivity module [qhd6+qhd7] under both long-day (LD) and short-day (SD) conditions.
* The molecular marker set proposed by this invention allows breeders to predict the degree of TPS in northern early rice progenies derived from crosses with the donor parent, aiding in parental selection and screening progenies with strong TPS in blast-resistant biotechnology breeding schemes.

### Potential Applications:
This technology can be applied in rice breeding programs to improve blast resistance and enhance photo-sensitivity prediction in progenies.

### Problems Solved:
This innovation addresses the challenge of accurately predicting and selecting for photo-sensitivity in rice breeding, particularly in blast-resistant varieties.

### Benefits:
- Enhanced accuracy in predicting photo-sensitivity in rice progenies
- Improved efficiency in blast-resistant biotechnology breeding programs
- Facilitates targeted selection of progenies with desired traits

### Commercial Applications:
Title: "Enhanced Photo-sensitivity Prediction for Improved Rice Blast Resistance"
This technology can be utilized by agricultural biotechnology companies, seed producers, and research institutions involved in rice breeding to develop high-yielding and disease-resistant rice varieties.

### Questions about the Technology:
#### 1. How does this technology improve the efficiency of rice breeding programs?
This technology streamlines the process of predicting photo-sensitivity in rice progenies, allowing breeders to make informed decisions during parental selection and progeny screening.

#### 2. What are the implications of accurate photo-sensitivity prediction in blast-resistant rice varieties?
Accurate photo-sensitivity prediction enables breeders to develop rice varieties with enhanced resistance to blast disease while maintaining optimal growth and yield characteristics.


==Original Abstract Submitted==

this invention describes a work including both genetic analysis and development of a marker set for a photo-sensitivity module underlying transgressive photo-sensitivity (tps) phenomenon found in the breeding improvement of rice blast resistance by the introduction of gene, belonging to the field of rice molecular genetics and biotechnology breeding. by using bi-parental ril populations derived from tps crosses with a donor as one parent, genetic analysis has been carried out to map the photo-sensitivity module [qhd6+qhd7] under both long-day (ld) and short-day (sd) conditions. with the aid of the molecular marker set proposed by this invention for this module, breeders can predict the degree of tps in northern early rice progenies derived from crosses with donor as one parent when they are doing parental selection or screening progenies carrying without strong tps in blast-resistant biotechnology breeding schemes.



[[Category:C12Q1/6895]]
[[Category:C12Q1/6853]]
[[Category:CPC_C12Q1/6895]]