View source for Category:Wim Tjibbo TEL

== Wim Tjibbo TEL ==

=== Executive Summary ===
Wim Tjibbo TEL is an inventor who has filed 5 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (3 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (3 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), and they have worked with companies such as ASML NETHERLANDS B.V. (4 patents), ASML Netherlands B.V. (1 patents). Their most frequent collaborators include [[Category:Mark John MASLOW|Mark John MASLOW]] (3 collaborations), [[Category:Abraham SLACHTER|Abraham SLACHTER]] (2 collaborations), [[Category:Koenraad VAN INGEN SCHENAU|Koenraad VAN INGEN SCHENAU]] (2 collaborations).

=== Patent Filing Activity ===
[[File:Wim_Tjibbo_TEL_Monthly_Patent_Applications.png|border|800px]]

=== Technology Areas ===
[[File:Wim_Tjibbo_TEL_Top_Technology_Areas.png|border|800px]]

==== List of Technology Areas ====
* [[:Category:CPC_G03F7/705|G03F7/705]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 3 patents
* [[:Category:CPC_G03F7/70625|G03F7/70625]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 3 patents
* [[:Category:CPC_G03F7/70633|G03F7/70633]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
* [[:Category:CPC_H01L22/20|H01L22/20]] ({Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps}): 2 patents
* [[:Category:CPC_G03F7/70558|G03F7/70558]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G06T7/0004|G06T7/0004]] ({Industrial image inspection}): 1 patents
* [[:Category:CPC_G06F30/20|G06F30/20]] (ELECTRIC DIGITAL DATA PROCESSING  (computer systems based on specific computational models): 1 patents
* [[:Category:CPC_H01L21/00|H01L21/00]] (Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof): 1 patents
* [[:Category:CPC_G03F7/2043|G03F7/2043]] (Exposure; Apparatus therefor  (photographic printing apparatus for making copies): 1 patents
* [[:Category:CPC_G03F7/70616|G03F7/70616]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G05B19/41875|G05B19/41875]] (CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS  (systems for controlling or regulating non-electric variables): 1 patents
* [[:Category:CPC_G03F1/44|G03F1/44]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/70508|G03F7/70508]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G05B19/41885|G05B19/41885]] (CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS  (systems for controlling or regulating non-electric variables): 1 patents
* [[:Category:CPC_G05B2219/45031|G05B2219/45031]] (CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS  (systems for controlling or regulating non-electric variables): 1 patents
* [[:Category:CPC_G03F7/70525|G03F7/70525]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/7065|G03F7/7065]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/70658|G03F7/70658]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents

=== Companies ===
[[File:Wim_Tjibbo_TEL_Top_Companies.png|border|800px]]

==== List of Companies ====
* ASML NETHERLANDS B.V.: 4 patents
* ASML Netherlands B.V.: 1 patents

=== Collaborators ===
* [[:Category:Mark John MASLOW|Mark John MASLOW]][[Category:Mark John MASLOW]] (3 collaborations)
* [[:Category:Abraham SLACHTER|Abraham SLACHTER]][[Category:Abraham SLACHTER]] (2 collaborations)
* [[:Category:Koenraad VAN INGEN SCHENAU|Koenraad VAN INGEN SCHENAU]][[Category:Koenraad VAN INGEN SCHENAU]] (2 collaborations)
* [[:Category:Frank STAALS|Frank STAALS]][[Category:Frank STAALS]] (2 collaborations)
* [[:Category:Stefan HUNSCHE of Santa Clara CA (US)|Stefan HUNSCHE of Santa Clara CA (US)]][[Category:Stefan HUNSCHE of Santa Clara CA (US)]] (1 collaborations)
* [[:Category:Anton Bernhard VAN OOSTEN|Anton Bernhard VAN OOSTEN]][[Category:Anton Bernhard VAN OOSTEN]] (1 collaborations)
* [[:Category:Gijsbert RISPENS|Gijsbert RISPENS]][[Category:Gijsbert RISPENS]] (1 collaborations)
* [[:Category:Brennan PETERSON of Longmont CO (US)|Brennan PETERSON of Longmont CO (US)]][[Category:Brennan PETERSON of Longmont CO (US)]] (1 collaborations)
* [[:Category:Patrick WARNAAR|Patrick WARNAAR]][[Category:Patrick WARNAAR]] (1 collaborations)
* [[:Category:Roy ANUNCIADO|Roy ANUNCIADO]][[Category:Roy ANUNCIADO]] (1 collaborations)
* [[:Category:Simon Hendrik Celine VAN GORP|Simon Hendrik Celine VAN GORP]][[Category:Simon Hendrik Celine VAN GORP]] (1 collaborations)
* [[:Category:Marinus JOCHEMSEN|Marinus JOCHEMSEN]][[Category:Marinus JOCHEMSEN]] (1 collaborations)
* [[:Category:Paul Christiaan HINNEN|Paul Christiaan HINNEN]][[Category:Paul Christiaan HINNEN]] (1 collaborations)
* [[:Category:Jill Elizabeth FREEMAN of San Jose CA (US)|Jill Elizabeth FREEMAN of San Jose CA (US)]][[Category:Jill Elizabeth FREEMAN of San Jose CA (US)]] (1 collaborations)
* [[:Category:Vivek Kumar JAIN of Fremont CA (US)|Vivek Kumar JAIN of Fremont CA (US)]][[Category:Vivek Kumar JAIN of Fremont CA (US)]] (1 collaborations)
* [[:Category:Kuo-Feng PAO|Kuo-Feng PAO]][[Category:Kuo-Feng PAO]] (1 collaborations)
* [[:Category:Hermanus Adrianus DILLEN|Hermanus Adrianus DILLEN]][[Category:Hermanus Adrianus DILLEN]] (1 collaborations)
* [[:Category:Marc Jurian KEA of Morgan Hill CA (US)|Marc Jurian KEA of Morgan Hill CA (US)]][[Category:Marc Jurian KEA of Morgan Hill CA (US)]] (1 collaborations)
* [[:Category:Koen THUIJS|Koen THUIJS]][[Category:Koen THUIJS]] (1 collaborations)
* [[:Category:Peter David ENGBLOM of Hillsboro OR (US)|Peter David ENGBLOM of Hillsboro OR (US)]][[Category:Peter David ENGBLOM of Hillsboro OR (US)]] (1 collaborations)
* [[:Category:Ralph Timotheus HUIJGEN of Hillsboro OR (US)|Ralph Timotheus HUIJGEN of Hillsboro OR (US)]][[Category:Ralph Timotheus HUIJGEN of Hillsboro OR (US)]] (1 collaborations)
* [[:Category:Daan Maurits SLOTBOOM|Daan Maurits SLOTBOOM]][[Category:Daan Maurits SLOTBOOM]] (1 collaborations)
* [[:Category:Johannes Catharinus Hubertus MULKENS|Johannes Catharinus Hubertus MULKENS]][[Category:Johannes Catharinus Hubertus MULKENS]] (1 collaborations)

[[Category:Wim Tjibbo TEL]]
[[Category:Inventors]]
[[Category:Inventors filing patents with ASML NETHERLANDS B.V.]]
[[Category:Inventors filing patents with ASML Netherlands B.V.]]