View source for Category:Kaustuve BHATTACHARYYA

== Kaustuve BHATTACHARYYA ==

=== Executive Summary ===
Kaustuve BHATTACHARYYA is an inventor who has filed 4 patents. Their primary areas of innovation include {for microlithography  (measuring printed patterns for monitoring overlay (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices (2 patents), and they have worked with companies such as ASML Netherlands B.V. (3 patents), ASML NETHERLANDS B.V. (1 patents). Their most frequent collaborators include [[Category:Simon Gijsbert Josephus MATHIJSSEN|Simon Gijsbert Josephus MATHIJSSEN]] (4 collaborations), [[Category:Sebastianus Adrianus GOORDEN|Sebastianus Adrianus GOORDEN]] (2 collaborations), [[Category:Leendert Jan KARSSEMEIJER|Leendert Jan KARSSEMEIJER]] (1 collaborations).

=== Patent Filing Activity ===
[[File:Kaustuve_BHATTACHARYYA_Monthly_Patent_Applications.png|border|800px]]

=== Technology Areas ===
[[File:Kaustuve_BHATTACHARYYA_Top_Technology_Areas.png|border|800px]]

==== List of Technology Areas ====
* [[:Category:CPC_G03F9/7046|G03F9/7046]] ({for microlithography  (measuring printed patterns for monitoring overlay): 2 patents
* [[:Category:CPC_G03F7/70625|G03F7/70625]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
* [[:Category:CPC_G03F7/70633|G03F7/70633]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 2 patents
* [[:Category:CPC_G03F7/706831|G03F7/706831]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F7/706837|G03F7/706837]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F9/7019|G03F9/7019]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
* [[:Category:CPC_G03F9/7092|G03F9/7092]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents
* [[:Category:CPC_G03F7/70641|G03F7/70641]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
* [[:Category:CPC_G03F9/7042|G03F9/7042]] ({for microlithography  (measuring printed patterns for monitoring overlay): 1 patents

=== Companies ===
[[File:Kaustuve_BHATTACHARYYA_Top_Companies.png|border|800px]]

==== List of Companies ====
* ASML Netherlands B.V.: 3 patents
* ASML NETHERLANDS B.V.: 1 patents

=== Collaborators ===
* [[:Category:Simon Gijsbert Josephus MATHIJSSEN|Simon Gijsbert Josephus MATHIJSSEN]][[Category:Simon Gijsbert Josephus MATHIJSSEN]] (4 collaborations)
* [[:Category:Sebastianus Adrianus GOORDEN|Sebastianus Adrianus GOORDEN]][[Category:Sebastianus Adrianus GOORDEN]] (2 collaborations)
* [[:Category:Leendert Jan KARSSEMEIJER|Leendert Jan KARSSEMEIJER]][[Category:Leendert Jan KARSSEMEIJER]] (1 collaborations)
* [[:Category:Manouk RIJPSTRA|Manouk RIJPSTRA]][[Category:Manouk RIJPSTRA]] (1 collaborations)
* [[:Category:Ralph BRINKHOF|Ralph BRINKHOF]][[Category:Ralph BRINKHOF]] (1 collaborations)
* [[:Category:Timothy Dugan DAVIS of Portland OR (US)|Timothy Dugan DAVIS of Portland OR (US)]][[Category:Timothy Dugan DAVIS of Portland OR (US)]] (1 collaborations)
* [[:Category:Armand Eugene Albert KOOLEN|Armand Eugene Albert KOOLEN]][[Category:Armand Eugene Albert KOOLEN]] (1 collaborations)
* [[:Category:Sera JEON|Sera JEON]][[Category:Sera JEON]] (1 collaborations)
* [[:Category:Shuo-Chun LIN|Shuo-Chun LIN]][[Category:Shuo-Chun LIN]] (1 collaborations)
* [[:Category:Patricius Aloysius Jacobus TINNEMANS|Patricius Aloysius Jacobus TINNEMANS]][[Category:Patricius Aloysius Jacobus TINNEMANS]] (1 collaborations)
* [[:Category:Arie Jeffrey DEN BOEF|Arie Jeffrey DEN BOEF]][[Category:Arie Jeffrey DEN BOEF]] (1 collaborations)
* [[:Category:Samee Ur REHMAN of Milpitas CA (US)|Samee Ur REHMAN of Milpitas CA (US)]][[Category:Samee Ur REHMAN of Milpitas CA (US)]] (1 collaborations)

[[Category:Kaustuve BHATTACHARYYA]]
[[Category:Inventors]]
[[Category:Inventors filing patents with ASML NETHERLANDS B.V.]]
[[Category:Inventors filing patents with ASML Netherlands B.V.]]