View source for Applied materials, inc. (20250118538). REMOTE PLASMA SOURCE

=REMOTE PLASMA SOURCE=


==Organization Name==

[[:Category:applied materials, inc.|applied materials, inc.]]


[[Category:applied materials, inc.]]

==Inventor(s)==

[[:Category:Kartik Ramaswamy of San Jose CA US|Kartik Ramaswamy of San Jose CA US]][[Category:Kartik Ramaswamy of San Jose CA US]]

[[:Category:Mehran Moalem of Fremont CA US|Mehran Moalem of Fremont CA US]][[Category:Mehran Moalem of Fremont CA US]]

[[:Category:Farhad Moghadam of Saratoga CA US|Farhad Moghadam of Saratoga CA US]][[Category:Farhad Moghadam of Saratoga CA US]]

[[:Category:Eller Y. Juco of San Leandro CA US|Eller Y. Juco of San Leandro CA US]][[Category:Eller Y. Juco of San Leandro CA US]]

==REMOTE PLASMA SOURCE==


This abstract first appeared for US patent application 20250118538 titled 'REMOTE PLASMA SOURCE

==Original Abstract Submitted==

some embodiments are directed to a remote plasma system. the remote plasma system may include: a first tube; a second tube; a first isolation component coupled between a first end of the first tube and a first end of the second tube; a second isolation component coupled between a second end of the first tube and a second end of the second tube; and a first capacitive element coupled to the first isolation component.



[[Category:H01J37/32]]
[[Category:CPC_H01J37/32357]]