View source for 20250215561. Substrate Process (Kokusai Electric)

= Substrate Processing Apparatus, Heat Insulating Structure, Method of Manufacturing Semiconductor Device and Non-transitory Computer-readable Recording Medium =

'''Abstract''':
it is possible to reduce a flow rate of a purge gas for purging an inside of a heat insulating structure. there is provided a technique that includes: a process chamber in which a substrate is processed; a substrate support configured to support the substrate; and a heat insulating structure provided below the substrate support and including: a vessel configured such that a horizontal cross-sectional area of an upper part of an inner space of the vessel is greater than that of a lower part of the inner space of the vessel; a first inert gas supplier configured to be capable of supplying an inert gas into the vessel; and an opening through which an inside and an outside of the vessel is capable of communicating with each other.

'''Inventor(s)''': [[:Category:Yusaku OKAJIMA of Toyama  JP|Yusaku OKAJIMA]]

'''CPC Classification''': [[:Category:CPC_C23C16/4408|C23C16/4408]] (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL  (making metal-coated products by extrusion ; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. , ; metallising of glass ; metallising mortars, concrete, artificial stone, ceramics or natural stone ; enamelling of, or applying a vitreous layer to, metals ; treating metal surfaces or coating of metals by electrolysis or electrophoresis ; single-crystal film growth ; by metallising textiles ; decorating textiles by locally metallising ))


[[Category:Patent Applications]]
[[Category:Kokusai Electric Corporation]]
[[Category:CPC_C23C16/4408]]
[[Category:Yusaku OKAJIMA of Toyama  JP]]

[https://wikipatents.org/index.php?search=20250215561+rejection&title=Special%3ASearch&wprov=acrw1_-1 Search for rejections for patent application number 20250215561]


<!-- JSON-LD markup for search engines:
{"@context":"https://schema.org","@type":"TechArticle","headline":"20250215561. Substrate Process (Kokusai Electric)","name":"20250215561. Substrate Process (Kokusai Electric)","description":"Patent application abstract and classification for 20250215561 - Substrate Process","datePublished":"2025-07-03","mainEntity":{"@type":"GovernmentPermit","permitType":"Patent Application","identifier":"20250215561","name":"Substrate Process","additionalProperty":[{"@type":"PropertyValue","name":"Organization","value":"Kokusai Electric Corporation"}]}}
-->