View source for 20250196466. Buffer Material, Exteri (MITSUI CHEMICALS, .)

= BUFFER MATERIAL, EXTERIOR MATERIAL, AND ROBOT COMPONENT =

'''Abstract''':
a buffer material () includes a gel layer () and a skin layer (). the gel layer () includes a polyurethane gel. the gel layer () has a storage modulus (e′) at 23� c. of 0.01 mpa or more and 10 mpa or less. the skin layer () is disposed on one surface of the gel layer (). the skin layer () has a 100% modulus of less than 5.0 mpa or less, and/or the skin layer () has a fine uneven structure in a surface thereof and the surface of the skin layer () has an arithmetic average roughness ra of more than 0 �m and 10 �m or less, as measured according to the following conditions:

'''Inventor(s)''': [[:Category:Kei SUGAWARA of Ichihara-shi, CHIBA  JP|Kei SUGAWARA]], [[:Category:Takahiro KONDO of Ichihara-shi, CHIBA  JP|Takahiro KONDO]], [[:Category:Masakazu KAGEOKA of Kawasaki-shi, KANAGAWA  JP|Masakazu KAGEOKA]]

'''CPC Classification''': [[:Category:CPC_B32B3/30|B32B3/30]] (characterised by a layer formed with recesses or projections, e.g. {hollows, grooves, protuberances, ribs  (apertured layer ; layer with cavities or internal voids )})


[[Category:Patent Applications]]
[[Category:MITSUI CHEMICALS, INC.]]
[[Category:CPC_B32B3/30]]
[[Category:Kei SUGAWARA of Ichihara-shi, CHIBA  JP]]
[[Category:Takahiro KONDO of Ichihara-shi, CHIBA  JP]]
[[Category:Masakazu KAGEOKA of Kawasaki-shi, KANAGAWA  JP]]

[https://wikipatents.org/index.php?search=20250196466+rejection&title=Special%3ASearch&wprov=acrw1_-1 Search for rejections for patent application number 20250196466]


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