View source for 20250196072. Poly(quinoline) Membranes (ENTEGRIS, .)

= POLY(QUINOLINE) MEMBRANES =

'''Abstract''':
in summary, the disclosure provides certain membranes useful as filter materials in the removal of metal ions, metal particulates, and/or organic contaminants from liquid compositions, in particular liquid compositions used in the microelectronic device industry. the membranes of the disclosure are porous membranes comprised of poly(quinoline) polymers. advantageously, the poly(quinoline) membranes are thermally stable and hydrolytically stable and can thus be cleaned between uses using acidic material such as dilute hydrochloric acid, without suffering from significant degradation. the poly(quinoline) polymers can be designed to be soluble in certain solvents, thus enabling the manufacture of the corresponding porous membranes by immersion-casting techniques.

'''Inventor(s)''': [[:Category:Zhifeng Li of Acton MA US|Zhifeng Li]], [[:Category:Sina Bonyadi of Billerica MA US|Sina Bonyadi]], [[:Category:Pushkara Rao Varanasi of Poughkeepsie NY US|Pushkara Rao Varanasi]]

'''CPC Classification''': [[:Category:CPC_B01D71/58|B01D71/58]] (SEPARATION  (separating solids from solids by wet methods , ; by pneumatic jigs or tables ; by other dry methods ; magnetic or electrostatic separation of solid materials from solid materials or fluids, separation by high-voltage electric fields ; centrifuges, vortex apparatus ; presses per se for squeezing-out liquid from liquid-containing material ; treatment of water , e.g. softening by ion-exchange ; {arrangements of air intake cleaners in gas turbine plants } ; arrangements or mounting of filters in air-conditioning, air-humidification or ventilation ))


[[Category:Patent Applications]]
[[Category:ENTEGRIS, INC.]]
[[Category:CPC_B01D71/58]]
[[Category:Zhifeng Li of Acton MA US]]
[[Category:Sina Bonyadi of Billerica MA US]]
[[Category:Pushkara Rao Varanasi of Poughkeepsie NY US]]

[https://wikipatents.org/index.php?search=20250196072+rejection&title=Special%3ASearch&wprov=acrw1_-1 Search for rejections for patent application number 20250196072]


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