View source for 20250188314. Polishing Composition (FUJIMI INCORPORATED)

= POLISHING COMPOSITION =

'''Abstract''':
[problem] to provide polishing compositions and methods that can enable control over the sin removal rate.

'''Inventor(s)''': [[:Category:Shogo ONISHI of Tualatin OR US|Shogo ONISHI]]

'''CPC Classification''': [[:Category:CPC_C09G1/02|C09G1/02]] (POLISHING COMPOSITIONS  (French polish ); SKI WAXES)


[[Category:Patent Applications]]
[[Category:FUJIMI INCORPORATED]]
[[Category:CPC_C09G1/02]]
[[Category:Shogo ONISHI of Tualatin OR US]]

[https://wikipatents.org/index.php?search=20250188314+rejection&title=Special%3ASearch&wprov=acrw1_-1 Search for rejections for patent application number 20250188314]


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