View source for 20250179236. Polyether-containing Po (Align Technology, .)

= POLYETHER-CONTAINING POLYMERIZABLE COMPOUNDS AND USE IN CURABLE RESIN COMPOSITIONS =

'''Abstract''':
this disclosure provides polymerizable resin compositions comprising a hydrophobic polyether-containing polymerizable polyurethane compound to impart improved stain resistance to polymeric materials formed from the polymerizable resin compositions. further provided herein are methods of producing the compositions and using the same for the fabrication of dental devices, such as orthodontic appliances.

'''Inventor(s)''': [[:Category:Liang CHEN of Fremont CA US|Liang CHEN]], [[:Category:Umesh Upendra CHOUDHARY of Scotts Valley CA US|Umesh Upendra CHOUDHARY]]

'''CPC Classification''': [[:Category:CPC_C08G18/673|C08G18/673]] (Unsaturated compounds having active hydrogen)


[[Category:Patent Applications]]
[[Category:Align Technology, Inc.]]
[[Category:CPC_C08G18/673]]
[[Category:Liang CHEN of Fremont CA US]]
[[Category:Umesh Upendra CHOUDHARY of Scotts Valley CA US]]

[https://wikipatents.org/index.php?search=20250179236+rejection&title=Special%3ASearch&wprov=acrw1_-1 Search for rejections for patent application number 20250179236]


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