View source for 20250174956. Laser System Method (TRUMPF Laser)

= LASER SYSTEM AND METHOD FOR PROVIDING A PULSED LASER BEAM INTENDED FOR INTERACTION WITH A TARGET MATERIAL =

'''Abstract''':
a laser system includes a beam deflection unit, a control unit, a laser beam source for providing a pulsed input laser beam for coupling into the beam deflection unit, and a target area for arranging a target material. the control unit is configured to control and/or regulate a position of a pulsed laser beam emerging from the beam deflection unit by actuating the beam deflection unit. the control unit has a first operating mode, in which the position of the pulsed laser beam is selected so that it is directed onto the target area, and a second operating mode, in which the position of the pulsed laser beam is selected so that it misses the target area. pulsed laser beams provided in the second operating mode are positioned symmetrically in a chronological and/or spatial average with respect to the pulsed laser beams formed in the first operating mode.

'''Inventor(s)''': [[:Category:Jonathan Brons of Aichhalden  DE|Jonathan Brons]], [[:Category:Sven-Silvius Schad of Rottweil  DE|Sven-Silvius Schad]], [[:Category:Michael Harteker of Rottweil  DE|Michael Harteker]], [[:Category:Stephan Häfner of Donaueschingen  DE|Stephan Häfner]], [[:Category:Dirk Sutter of Rottweil  DE|Dirk Sutter]]

'''CPC Classification''': [[:Category:CPC_H01S3/0071|H01S3/0071]] (Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range  (semiconductors lasers ))


[[Category:Patent Applications]]
[[Category:TRUMPF Laser GmbH]]
[[Category:CPC_H01S3/0071]]
[[Category:Jonathan Brons of Aichhalden  DE]]
[[Category:Sven-Silvius Schad of Rottweil  DE]]
[[Category:Michael Harteker of Rottweil  DE]]
[[Category:Stephan Häfner of Donaueschingen  DE]]
[[Category:Dirk Sutter of Rottweil  DE]]

[https://wikipatents.org/index.php?search=20250174956+rejection&title=Special%3ASearch&wprov=acrw1_-1 Search for rejections for patent application number 20250174956]


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