View source for 20240032186. STRUCTURE, METHOD FOR MANUFACTURING STRUCTURE, AND COMPOSITION simplified abstract (FUJIFILM Corporation)

=STRUCTURE, METHOD FOR MANUFACTURING STRUCTURE, AND COMPOSITION=


==Organization Name==

[[:Category:FUJIFILM Corporation|FUJIFILM Corporation]]


[[Category:FUJIFILM Corporation]]

==Inventor(s)==

[[:Category:Seiya Masuda of Haibara-gun (JP)|Seiya Masuda of Haibara-gun (JP)]][[Category:Seiya Masuda of Haibara-gun (JP)]]

==STRUCTURE, METHOD FOR MANUFACTURING STRUCTURE, AND COMPOSITION - A simplified explanation of the abstract==


This abstract first appeared for US patent application 20240032186 titled 'STRUCTURE, METHOD FOR MANUFACTURING STRUCTURE, AND COMPOSITION

==Simplified Explanation==

The abstract of the patent application describes a structure and method for manufacturing a structure with excellent shielding performance against electromagnetic waves in a frequency band of several tens of GHz. The structure includes a substrate, passive elements (inductor or balun), and an electromagnetic wave absorbing film containing magnetic particles.

* The structure has excellent shielding performance against electromagnetic waves in a frequency band of several tens of GHz.
* The structure includes a substrate, passive elements (inductor or balun), and an electromagnetic wave absorbing film.
* The electromagnetic wave absorbing film contains magnetic particles.
* The complex part of the complex relative magnetic permeability of the electromagnetic wave absorbing film satisfies specific requirements at different frequencies (28 GHz, 47 GHz, and 60 GHz).

Potential applications of this technology:
* Electronics and telecommunications industries where shielding against electromagnetic waves is required.
* Wireless communication devices operating in the frequency band of several tens of GHz.
* Radar systems and satellite communication systems.

Problems solved by this technology:
* Provides excellent shielding performance against electromagnetic waves in a specific frequency band.
* Enables easy manufacturing of structures with excellent shielding performance.

Benefits of this technology:
* Enhanced protection against electromagnetic interference.
* Improved performance and reliability of electronic devices operating in the frequency band of several tens of GHz.
* Simplified manufacturing process for structures with excellent shielding performance.


==Original Abstract Submitted==

provided are a structure having excellent shielding performance against electromagnetic waves in a frequency band of several tens of ghz, and a composition. further, provided is a method for manufacturing a structure which makes it possible to easily manufacture a structure having excellent shielding performance against electromagnetic waves in a frequency band of several tens of ghz. the structure includes a substrate, a plurality of passive elements disposed on the substrate, and an electromagnetic wave absorbing film positioned at least in a region between the plurality of passive elements disposed on the substrate. the passive element is selected from the group consisting of an inductor and a balun. the electromagnetic wave absorbing film contains magnetic particles. in a case where a real part of a complex relative magnetic permeability � of the electromagnetic wave absorbing film is defined as �′ and a complex part of the complex relative magnetic permeability � of the electromagnetic wave absorbing film is defined as �″, the complex part �″ of the complex relative magnetic permeability � of the electromagnetic wave absorbing film satisfies any one of requirements 1 to 3. requirement 1: �″ at a frequency of 28 ghz is 0.1 to 10, requirement 2: �″ at a frequency of 47 ghz is 0.1 to 5, and requirement 3: �″ at a frequency of 60 ghz is 0.1 to 2.



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