View source for 20240021426. Removable Ion Source Capable Of Axial Or Cross Beam Ionization simplified abstract (THERMO FINNIGAN LLC)

=Removable Ion Source Capable Of Axial Or Cross Beam Ionization=


==Organization Name==

[[:Category:THERMO FINNIGAN LLC|THERMO FINNIGAN LLC]]


[[Category:THERMO FINNIGAN LLC]]

==Inventor(s)==

[[:Category:Edward B. Mccauley of Cedar Park TX (US)|Edward B. Mccauley of Cedar Park TX (US)]][[Category:Edward B. Mccauley of Cedar Park TX (US)]]

[[:Category:Dustin Donald Holden of Round Rock TX (US)|Dustin Donald Holden of Round Rock TX (US)]][[Category:Dustin Donald Holden of Round Rock TX (US)]]

==Removable Ion Source Capable Of Axial Or Cross Beam Ionization - A simplified explanation of the abstract==


This abstract first appeared for US patent application 20240021426 titled 'Removable Ion Source Capable Of Axial Or Cross Beam Ionization

==Simplified Explanation==

The abstract describes an ion source that includes an ionization assembly, first and second electron sources, and a magnet assembly. The ionization assembly consists of an ionization chamber and at least one ion lens, arranged along a primary axis defined by the direction of an ion beam exiting the assembly. The first electron source is aligned with the primary axis and provides a parallel electron beam, while the second electron source is adjacent to the ionization assembly and provides an orthogonal electron beam. The magnet assembly, movable between two positions, aligns with either the first or second electron source.

* The patent describes an ion source with multiple electron sources and a movable magnet assembly.
* The ionization assembly includes an ionization chamber and at least one ion lens.
* The first electron source provides a parallel electron beam along the primary axis.
* The second electron source provides an orthogonal electron beam.
* The magnet assembly can be positioned to align with either the first or second electron source.

== Potential Applications ==
* Ion sources are used in various fields such as mass spectrometry, ion implantation, and particle accelerators.
* This technology could be applied in scientific research, medical diagnostics, and industrial processes requiring ion beams.

== Problems Solved ==
* The use of multiple electron sources allows for more versatile ionization processes.
* The movable magnet assembly enables the selection of different electron sources, providing flexibility in ion beam generation.

== Benefits ==
* The parallel and orthogonal electron beams offer enhanced control over the ionization process.
* The ability to switch between electron sources provides adaptability for different applications.
* The ionization assembly design along the primary axis allows for efficient ion beam production.


==Original Abstract Submitted==

an ion source including an ionization assembly, first and second electron sources, and a magnet assembly. the ionization assembly includes an ionization chamber and at least one ion lens. the ionization assembly has a primary axis defined by the direction of an ion beam exiting the ionization assembly and the ionization chamber and the at least one ion lens are arranged along the primary axis. the first electron source is aligned along the primary axis of the ionization assembly and is configured to provide an electron beam parallel to the primary axis. the second electron source is adjacent to the ionization assembly and is configured to provide an electron beam orthogonal to the primary axis. the magnet assembly includes a magnet. the magnet assembly is movable between a first position in which the magnet is aligned with the first electron source and a second position in which the magnet is aligned with the second electron source.



[[Category:H01J49/14]]