View source for 18834882. LITHOGRAPHIC APPARATUS CONTROLLER SYSTEM (ASML Netherlands B.V.)

=LITHOGRAPHIC APPARATUS CONTROLLER SYSTEM=


==Organization Name==

[[:Category:ASML Netherlands B.V.|ASML Netherlands B.V.]]


[[Category:ASML Netherlands B.V.]]

==Inventor(s)==

[[:Category:Bas Johannes Petrus Roset of Eindhoven NL|Bas Johannes Petrus Roset of Eindhoven NL]][[Category:Bas Johannes Petrus Roset of Eindhoven NL]]

==LITHOGRAPHIC APPARATUS CONTROLLER SYSTEM==


This abstract first appeared for US patent application 18834882 titled 'LITHOGRAPHIC APPARATUS CONTROLLER SYSTEM

==Original Abstract Submitted==

A controller system is configured to control a plant and comprising a feedforward controller to provide, based on a reference state signal, a feedforward signal to the plant, and a feedback controller system to provide a feedback signal to the plant, based on a difference between the reference state signal and a plant state signal representing an actual state of the plant. The feedback controller system comprises an integrator, a trajectory generator, and a selector. The feedback controller system is configured to operate as a function of the reference state in a first control mode or a second control mode, wherein the feedback controller system, in the first control mode, operates the selector to select the trajectory generator output signal generated by the trajectory generator, and wherein the feedback controller system, in the second control mode, operates the selector to select the integrator output signal generated by the integrator.



[[Category:G03F7/00]]
[[Category:G05B11/42]]
[[Category:CPC_G03F7/70725]]