View source for 18811911. SUBSTRATE DEGAS STATION (Applied Materials, Inc.)

=SUBSTRATE DEGAS STATION=


==Organization Name==

[[:Category:Applied Materials, Inc.|Applied Materials, Inc.]]


[[Category:Applied Materials, Inc.]]

==Inventor(s)==

[[:Category:Thomas Brezoczky of Los Gatos CA (US)|Thomas Brezoczky of Los Gatos CA (US)]][[Category:Thomas Brezoczky of Los Gatos CA (US)]]

[[:Category:Punnati Krushna Reddy of Bangalore (IN)|Punnati Krushna Reddy of Bangalore (IN)]][[Category:Punnati Krushna Reddy of Bangalore (IN)]]

[[:Category:Azhar Ali M.a. of Bangalore (IN)|Azhar Ali M.a. of Bangalore (IN)]][[Category:Azhar Ali M.a. of Bangalore (IN)]]

[[:Category:Kirankumar Neelasandra Savandaiah of Bangalore (IN)|Kirankumar Neelasandra Savandaiah of Bangalore (IN)]][[Category:Kirankumar Neelasandra Savandaiah of Bangalore (IN)]]

[[:Category:Lakshmikanth Krishnamurthy Shirahatti of Bangalore (IN)|Lakshmikanth Krishnamurthy Shirahatti of Bangalore (IN)]][[Category:Lakshmikanth Krishnamurthy Shirahatti of Bangalore (IN)]]

[[:Category:Dhritiman Subha Kashyap of Bangalore (IN)|Dhritiman Subha Kashyap of Bangalore (IN)]][[Category:Dhritiman Subha Kashyap of Bangalore (IN)]]

==SUBSTRATE DEGAS STATION==


This abstract first appeared for US patent application 18811911 titled 'SUBSTRATE DEGAS STATION

==Original Abstract Submitted==

Degas stations for degassing substrates that are conveyed through a substrate processing system on a magnetically levitated carrier and related methods are provided. The method includes magnetically levitating a carrier with a substrate disposed thereon in a first position between a reflector assembly and a heater assembly disposed within a housing of the station. The method further includes moving both the reflector assembly and the heater assembly from a retracted position to an extended position while the carrier is disposed between the reflector assembly and heater assembly. The method further includes degassing the substrate disposed on the carrier with the heater assembly while the reflector assembly and heater assembly are each in the extended position, wherein the degassing includes pumping a purge gas through a gas port formed in at least one of the reflector assembly or the heater assembly towards the substrate.



[[Category:H01L21/67]]
[[Category:H01L21/324]]
[[Category:H01L21/677]]
[[Category:H01L21/687]]
[[Category:CPC_H01L21/67115]]