View source for 18755946. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)

=PLASMA PROCESSING APPARATUS=


==Organization Name==

[[:Category:Tokyo Electron Limited|Tokyo Electron Limited]]


[[Category:Tokyo Electron Limited]]

==Inventor(s)==

[[:Category:Masaki Hirayama of Tokyo (JP)|Masaki Hirayama of Tokyo (JP)]][[Category:Masaki Hirayama of Tokyo (JP)]]

==PLASMA PROCESSING APPARATUS==


This abstract first appeared for US patent application 18755946 titled 'PLASMA PROCESSING APPARATUS




==Original Abstract Submitted==

A plasma processing apparatus includes a chamber, a substrate support, an excitation electrode, and a resonator. The resonator includes an inner side portion and an outer side portion extending coaxially, and conductive plates arranged parallel to each other in a vertical direction. The resonator provides a waveguide path extending between the inner and outer side portions and including a plurality of layers arranged alternately with the conductive plates. Each of the plurality of layers is connected to a layer thereabove at one of a plurality of folded portions along the inner side portion or the outer side portion. A lowermost conductive plate includes a plurality of slots electromagnetically coupled to the discharger. The plurality of slots is arranged in a circumferential direction, and a wall surrounding a lowermost layer in the outer side portion extends along sides of a polygon.



[[Category:H01J37/32]]
[[Category:CPC_H01J37/321]]