View source for 18755485. FILM FORMING SYSTEM, METHOD FOR CONTROLLING FILM FORMING SYSTEM, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)

=FILM FORMING SYSTEM, METHOD FOR CONTROLLING FILM FORMING SYSTEM, AND ARTICLE MANUFACTURING METHOD=


==Organization Name==

[[:Category:CANON KABUSHIKI KAISHA|CANON KABUSHIKI KAISHA]]


[[Category:CANON KABUSHIKI KAISHA]]

==Inventor(s)==

[[:Category:Takeshi Yamamoto of Kanagawa (JP)|Takeshi Yamamoto of Kanagawa (JP)]][[Category:Takeshi Yamamoto of Kanagawa (JP)]]

==FILM FORMING SYSTEM, METHOD FOR CONTROLLING FILM FORMING SYSTEM, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18755485 titled 'FILM FORMING SYSTEM, METHOD FOR CONTROLLING FILM FORMING SYSTEM, AND ARTICLE MANUFACTURING METHOD

'''Simplified Explanation:'''
The patent application describes a film forming system that includes a conveyance carrier moving along a conveyance path, holding a substrate and a mask. The mask shields a non-formation area on the substrate, while a film formation unit forms a film on the film formation area of the substrate.

'''Key Features and Innovation:'''
* Conveyance carrier holds substrate and mask, moving along a conveyance path.
* Mask shields non-formation area on the substrate.
* Film formation unit forms a film on the film formation area of the substrate.
* Conveyance unit moves the carrier in intersecting directions.
* Mask supply unit supplies the carrier with the mask.

'''Potential Applications:'''
This technology could be used in industries requiring precise film formation on substrates, such as semiconductor manufacturing, display panel production, and optical coatings.

'''Problems Solved:'''
The system addresses the need for accurate film formation on specific areas of substrates while protecting other areas from unwanted film deposition.

'''Benefits:'''
* Enables precise film formation on substrates.
* Increases efficiency in manufacturing processes.
* Reduces material waste by targeting specific film formation areas.

'''Commercial Applications:'''
The technology could be valuable in industries like electronics, optics, and automotive, where controlled film deposition is crucial for product performance and quality.

'''Prior Art:'''
Readers can explore prior patents related to film forming systems, conveyance carriers, and mask supply units to understand the evolution of this technology.

'''Frequently Updated Research:'''
Stay informed about advancements in film forming systems, substrate handling technologies, and mask design for improved film deposition processes.

'''Questions about Film Forming Systems:'''
1. What are the key components of a film forming system?
2. How does the mask supply unit contribute to the efficiency of the film formation process?


==Original Abstract Submitted==

A film forming system includes a conveyance carrier configured to hold a substrate and a mask and move inside a conveyance path, the substrate including a film formation area, the mask being configured to shield a film non-formation area other than the film formation area, a conveyance unit disposed on the conveyance path and configured to move the conveyance carrier in a first direction and a second direction intersecting the first direction, a film formation unit located along the conveyance path and configured to form a film on the film formation area of the substrate, and a mask supply unit located along the conveyance path and configured to supply the conveyance carrier with the mask.



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