View source for 18668390. BORON NITRIDE PLATE SURFACE TREATMENT METHOD, METHOD FOR PRODUCING CERAMIC SINTERED BODY, AND METHOD FOR PRODUCING BORON NITRIDE PLATE simplified abstract (KABUSHIKI KAISHA TOSHIBA)

=BORON NITRIDE PLATE SURFACE TREATMENT METHOD, METHOD FOR PRODUCING CERAMIC SINTERED BODY, AND METHOD FOR PRODUCING BORON NITRIDE PLATE=


==Organization Name==

[[:Category:KABUSHIKI KAISHA TOSHIBA|KABUSHIKI KAISHA TOSHIBA]]


[[Category:KABUSHIKI KAISHA TOSHIBA]]

==Inventor(s)==

[[:Category:Ikki Matsumoto of Yokohama Kanagawa (JP)|Ikki Matsumoto of Yokohama Kanagawa (JP)]][[Category:Ikki Matsumoto of Yokohama Kanagawa (JP)]]

==BORON NITRIDE PLATE SURFACE TREATMENT METHOD, METHOD FOR PRODUCING CERAMIC SINTERED BODY, AND METHOD FOR PRODUCING BORON NITRIDE PLATE - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18668390 titled 'BORON NITRIDE PLATE SURFACE TREATMENT METHOD, METHOD FOR PRODUCING CERAMIC SINTERED BODY, AND METHOD FOR PRODUCING BORON NITRIDE PLATE

'''Simplified Explanation:'''
The patent application describes a method for treating the surface of a boron nitride plate using two polishing processes to prepare it for producing a silicon nitride substrate.

* The first polishing process involves using a polishing member with a grit size between F120 and F220 or between #240 and #320.
* The second polishing process utilizes a polishing member with a grit size between #360 and #1000.
* The second polishing process follows the first polishing process in sequence.

'''Key Features and Innovation:'''
* Two-step polishing process for treating boron nitride plate surface.
* Specific grit sizes used in each polishing process.
* Preparation of boron nitride plate for silicon nitride substrate production.

'''Potential Applications:'''
* Manufacturing of silicon nitride substrates.
* Semiconductor industry for high-performance applications.
* Aerospace industry for thermal management applications.

'''Problems Solved:'''
* Achieving a smooth and polished surface on boron nitride plates.
* Enhancing the quality of silicon nitride substrates.
* Improving the performance of materials in high-tech industries.

'''Benefits:'''
* Improved surface finish for boron nitride plates.
* Enhanced properties of silicon nitride substrates.
* Increased efficiency in semiconductor and aerospace applications.

'''Commercial Applications:'''
The technology can be applied in industries such as semiconductor manufacturing, aerospace engineering, and high-performance materials production, leading to improved product quality and performance.

'''Prior Art:'''
Readers can explore prior research on boron nitride plate surface treatments, silicon nitride substrate production, and polishing methods in materials science literature and patent databases.

'''Frequently Updated Research:'''
Stay updated on advancements in boron nitride plate treatments, silicon nitride substrate manufacturing, and polishing techniques by following relevant scientific journals and industry publications.

'''Questions about the Technology:'''
1. What are the specific benefits of using boron nitride plates in silicon nitride substrate production?
2. How does the two-step polishing process improve the quality of the boron nitride plate surface?


==Original Abstract Submitted==

A boron nitride plate surface treatment method according to an embodiment includes a first polishing process and a second polishing process. In the first polishing process, a surface of a boron nitride plate is polished by using a first polishing member having a grit within a range of not less than F120 and not more than F220 or within a range of not less than #240 and not more than #320. In the second polishing process, the surface of the boron nitride plate is polished by using a second polishing member having a grit within a range of not less than #360 and not more than #1000. The second polishing process is performed after the first polishing process. The boron nitride plate is suitable for a method for producing a silicon nitride substrate.



[[Category:B24B29/02]]
[[Category:CPC_B24B29/02]]