View source for 18632684. DOUBLE LAYER MEMS DEVICES AND METHOD OF MANUFACTURE simplified abstract (Murata Manufacturing Co., Ltd.)

=DOUBLE LAYER MEMS DEVICES AND METHOD OF MANUFACTURE=


==Organization Name==

[[:Category:Murata Manufacturing Co., Ltd.|Murata Manufacturing Co., Ltd.]]


[[Category:Murata Manufacturing Co., Ltd.]]

==Inventor(s)==

[[:Category:Petteri Kilpinen of Espoo (FI)|Petteri Kilpinen of Espoo (FI)]][[Category:Petteri Kilpinen of Espoo (FI)]]

[[:Category:Marko Peussa of Espoo (FI)|Marko Peussa of Espoo (FI)]][[Category:Marko Peussa of Espoo (FI)]]

[[:Category:Antti Iihola of Helsinki (FI)|Antti Iihola of Helsinki (FI)]][[Category:Antti Iihola of Helsinki (FI)]]

[[:Category:Altti Torkkeli of Tuusula (FI)|Altti Torkkeli of Tuusula (FI)]][[Category:Altti Torkkeli of Tuusula (FI)]]

==DOUBLE LAYER MEMS DEVICES AND METHOD OF MANUFACTURE - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18632684 titled 'DOUBLE LAYER MEMS DEVICES AND METHOD OF MANUFACTURE

The patent application describes a device with multiple layers, including a handle layer, suspension structure, patterned polycrystalline silicon (poly-Si) first device layer, seismic elements, patterned single-crystal silicon (mono-Si) second device layer, and moveably suspended seismic elements.

* The device includes a handle layer with at least one cavity and suspension structure.
* A patterned poly-Si first device layer is present, with at least one structural element suspended by the structure.
* A second electrically insulating layer is followed by a patterned mono-Si second device layer with moveably suspended seismic elements.
* A cap layer finalizes the structure, forming an enclosure with the handle layer and device layers.
* The enclosure includes seismic elements and static and moveable electrodes for motion detection or causation.

Potential Applications:
- Motion detection sensors
- Seismic activity monitoring devices
- Vibration detection systems

Problems Solved:
- Enhanced motion detection capabilities
- Improved seismic activity monitoring
- Increased sensitivity in vibration detection

Benefits:
- Higher accuracy in motion detection
- Real-time monitoring of seismic events
- Early warning systems for vibrations

Commercial Applications:
Title: Advanced Motion Detection Sensors for Industrial Use
This technology can be utilized in industries such as construction, manufacturing, and seismology for precise monitoring and detection of movements and vibrations.

Questions about the Technology:
1. How does the device improve upon existing motion detection technologies?
- The device's multiple layers and suspended elements enhance sensitivity and accuracy in motion detection.
2. What sets this seismic monitoring device apart from traditional systems?
- The inclusion of moveably suspended seismic elements in the second device layer allows for more precise monitoring of seismic activity.


==Original Abstract Submitted==

A device is provided that includes a handle layer with at least one cavity and suspension structure, a patterned polycrystalline silicon (poly-Si) first device layer, where at least one structural element is suspended by the structure, and may include a seismic element. A second electrically insulating layer is present, followed by a second device layer of patterned single-crystal silicon (mono-Si) with at least one moveably suspended seismic element above the first layer. A cap layer finalizes the structure, with the handle layer, device layers, and the cap layer forming an enclosure's walls. The first and second insulating layers bond the handle and device layers. The enclosure includes at least one seismic element from the second device layer, and at least one static and moveable electrode for motion detection or causation, with the static electrode in the first device layer.



[[Category:B81B3/00]]
[[Category:B81C1/00]]
[[Category:CPC_B81B3/0072]]