View source for 18600273. Optical Component with Apodized Mask simplified abstract (Apple Inc.)

=Optical Component with Apodized Mask=


==Organization Name==

[[:Category:Apple Inc.|Apple Inc.]]


[[Category:Apple Inc.]]

==Inventor(s)==

[[:Category:Takeyoshi Saiga of Taito-ku (JP)|Takeyoshi Saiga of Taito-ku (JP)]][[Category:Takeyoshi Saiga of Taito-ku (JP)]]

[[:Category:Yoshikazu Shinohara of Cupertino (CA)|Yoshikazu Shinohara of Cupertino (CA)]][[Category:Yoshikazu Shinohara of Cupertino (CA)]]

[[:Category:Alexander Feldman of Los Altos CA (US)|Alexander Feldman of Los Altos CA (US)]][[Category:Alexander Feldman of Los Altos CA (US)]]

[[:Category:Liangyu Qiu of Santa Clara CA (US)|Liangyu Qiu of Santa Clara CA (US)]][[Category:Liangyu Qiu of Santa Clara CA (US)]]

[[:Category:Junkyo Suh of Palo Alto CA (US)|Junkyo Suh of Palo Alto CA (US)]][[Category:Junkyo Suh of Palo Alto CA (US)]]

[[:Category:Yuhong Yao of Tracy CA (US)|Yuhong Yao of Tracy CA (US)]][[Category:Yuhong Yao of Tracy CA (US)]]

[[:Category:Milan Maksimovic of Sunnyvale CA (US)|Milan Maksimovic of Sunnyvale CA (US)]][[Category:Milan Maksimovic of Sunnyvale CA (US)]]

[[:Category:Moshe Kriman of Tel Aviv (IL)|Moshe Kriman of Tel Aviv (IL)]][[Category:Moshe Kriman of Tel Aviv (IL)]]

[[:Category:Dana Gal-fuss of Tel Aviv (IL)|Dana Gal-fuss of Tel Aviv (IL)]][[Category:Dana Gal-fuss of Tel Aviv (IL)]]

[[:Category:Refael Della Pergola of Jerusalem (IL)|Refael Della Pergola of Jerusalem (IL)]][[Category:Refael Della Pergola of Jerusalem (IL)]]

[[:Category:Maoz Ovadia of Kiryat Ono (IL)|Maoz Ovadia of Kiryat Ono (IL)]][[Category:Maoz Ovadia of Kiryat Ono (IL)]]

[[:Category:Aharon R. Barnea of Ramat Gan IL (US)|Aharon R. Barnea of Ramat Gan IL (US)]][[Category:Aharon R. Barnea of Ramat Gan IL (US)]]

==Optical Component with Apodized Mask - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18600273 titled 'Optical Component with Apodized Mask

The abstract of the patent application describes an optical component with a mask that has a light blocking portion and a light transmitting portion separated by mask edges, one of which is defined by an apodized pattern to reduce diffraction and flare caused by the mask.

* The optical component includes a mask with a light blocking portion and a light transmitting portion.
* The mask edges are defined by an apodized pattern to reduce diffraction and flare.
* The apodized pattern helps improve the optical performance of the component.
* By reducing diffraction and flare, the mask enhances the overall quality of the optical system.
* The innovation aims to improve the functionality of optical components in various applications.

Potential Applications:
- Optical systems
- Imaging devices
- Photolithography
- Microscopy
- Laser systems

Problems Solved:
- Diffraction and flare in optical components
- Maintaining optical system performance
- Enhancing image quality

Benefits:
- Improved optical performance
- Reduced diffraction and flare
- Enhanced image quality
- Better overall functionality of optical systems

Commercial Applications:
Title: Enhanced Optical Components for Improved Image Quality
This technology can be used in various commercial applications such as:
- Camera lenses
- Microscopes
- Telescopes
- Laser cutting systems
- Semiconductor manufacturing

Questions about the technology:
1. How does the apodized pattern on the mask edge reduce diffraction and flare?
   The apodized pattern gradually changes the intensity of light at the edge, reducing diffraction effects.
2. What are the potential drawbacks of using apodized patterns in optical components?
   Some potential drawbacks may include increased manufacturing complexity and cost.


==Original Abstract Submitted==

An optical component includes a mask defining a light blocking portion and a light transmitting portion of the optical component. The light blocking portion is separated from the light transmitting portion by one or more mask edges, at least one of which is defined by an apodized pattern. The apodized pattern of the mask edge reduces diffraction and thus flare caused by the mask.



[[Category:G03F1/38]]
[[Category:G02B5/04]]
[[Category:G03B17/12]]
[[Category:G03F1/54]]
[[Category:CPC_G03F1/38]]