View source for 18594707. SYSTEM AND METHOD TO REDUCE MEASUREMENT ERROR IN INTERFEROMETRY-BASED METROLOGY simplified abstract (KLA Corporation)

=SYSTEM AND METHOD TO REDUCE MEASUREMENT ERROR IN INTERFEROMETRY-BASED METROLOGY=


==Organization Name==

[[:Category:KLA Corporation|KLA Corporation]]


[[Category:KLA Corporation]]

==Inventor(s)==

[[:Category:Yuchi Chen of Singapore (SG)|Yuchi Chen of Singapore (SG)]][[Category:Yuchi Chen of Singapore (SG)]]

[[:Category:Yicheng Lai of Singapore (SG)|Yicheng Lai of Singapore (SG)]][[Category:Yicheng Lai of Singapore (SG)]]

==SYSTEM AND METHOD TO REDUCE MEASUREMENT ERROR IN INTERFEROMETRY-BASED METROLOGY - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18594707 titled 'SYSTEM AND METHOD TO REDUCE MEASUREMENT ERROR IN INTERFEROMETRY-BASED METROLOGY

The abstract describes a system with a laser source and a dual interferometer sub-system. The system includes a first channel with a first splitter element, a first power sensor, a first detector, and a controller.

* The first splitter element splits the laser beam into a first transmitted beam and a first reflected beam.
* The first power sensor measures the power of the first transmitted beam.
* The first detector records a first interferogram frame from the dual interferometer sub-system.
* The controller normalizes the intensity of the first interferogram frame based on the power measurement to produce a first normalized interferogram frame.

Potential Applications:
- Optical metrology
- Interferometry applications
- Laser power measurement

Problems Solved:
- Accurate power measurement of laser beams
- Precise interferogram frame normalization

Benefits:
- Improved accuracy in power measurement
- Enhanced interferogram analysis
- Increased precision in optical measurements

Commercial Applications:
Title: Laser Power Measurement System for Optical Metrology
This technology can be used in industries such as:
- Semiconductor manufacturing
- Aerospace engineering
- Medical imaging

Frequently Updated Research:
Researchers are constantly exploring new applications for interferometry and laser power measurement systems. Stay updated on the latest advancements in optical metrology.

Questions about Laser Power Measurement Systems:
1. How does the system ensure accurate power measurement of laser beams?
The system uses a power sensor to directly measure the power of the transmitted beam, ensuring precise results.

2. What are the potential commercial uses of this technology?
This technology can be applied in various industries for accurate optical measurements and interferometry applications.


==Original Abstract Submitted==

A system includes a laser source and a dual interferometer sub-system. A channel of the dual interferometer sub-system includes a first splitter element coupled to a first output beam from a laser source configured to split the first output beam into a first transmitted beam and a first reflected beam, a first power sensor configured to measure a power of the first transmitted beam, a first detector configured to receive a first interference signal from the dual interferometer sub-system and record a first interferogram frame. The system includes a controller coupled to the first power sensor and the first detector of the first channel of the dual interferometer sub-system configured to receive the first interferogram frame, receive a first laser power measurement from the first power sensor; and normalize an intensity of the first interferogram frame based on the first laser power measurement to produce a first normalized interferogram frame.



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