View source for 18530369. MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE simplified abstract (BOE Technology Group Co., Ltd.)

=MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE=


==Organization Name==

[[:Category:BOE Technology Group Co., Ltd.|BOE Technology Group Co., Ltd.]]


[[Category:BOE Technology Group Co., Ltd.]]

==Inventor(s)==

[[:Category:Chang Luo of Beijing (CN)|Chang Luo of Beijing (CN)]][[Category:Chang Luo of Beijing (CN)]]

[[:Category:Fengli Ji of Beijing (CN)|Fengli Ji of Beijing (CN)]][[Category:Fengli Ji of Beijing (CN)]]

[[:Category:Jianpeng Wu of Beijing (CN)|Jianpeng Wu of Beijing (CN)]][[Category:Jianpeng Wu of Beijing (CN)]]

[[:Category:Zhongying Yang of Beijing (CN)|Zhongying Yang of Beijing (CN)]][[Category:Zhongying Yang of Beijing (CN)]]

==MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18530369 titled 'MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE

==Simplified Explanation==
The patent application describes a mask with specific clamping regions and mesh regions that change shape when stretched in a certain direction.

==Key Features and Innovation==
* Mask design with first and second clamping regions and mesh regions.
* Mesh region changes shape when stretched, achieving a target shape different from the original.
* Target shape includes polygon, circle, or ellipse shapes.

==Potential Applications==
The mask design can be used in various manufacturing processes where precise stretching and shaping are required, such as in display substrate manufacturing.

==Problems Solved==
The technology addresses the need for masks that can change shape during stretching to achieve specific target shapes, improving manufacturing accuracy.

==Benefits==
* Enhanced precision in manufacturing processes.
* Ability to create complex shapes with ease.
* Improved efficiency in production.

==Commercial Applications==
* Display substrate manufacturing.
* Semiconductor industry for precise patterning.
* 3D printing for customized shapes.

==Prior Art==
Further research can be conducted in the field of mask design for manufacturing processes to explore similar innovations.

==Frequently Updated Research==
Stay updated on advancements in mask technology for manufacturing applications to enhance production processes.

==Questions about Mask Design==
===How does the mask design impact manufacturing efficiency?===
The mask design improves manufacturing efficiency by allowing for precise shaping during the stretching process, reducing errors and improving accuracy.

===What are the potential cost savings associated with using this mask design?===
Using this mask design can lead to cost savings by reducing material waste and improving production efficiency, ultimately lowering manufacturing costs.


==Original Abstract Submitted==

A mask, a manufacturing method therefor, and a manufacturing method for a display substrate are provided. The mask includes: a first clamping region and a second clamping region, which are opposite to each other in a first direction, and at least one mesh region between the first clamping region and the second clamping region, the mesh region is in a first shape, in a case where the mask is stretched in the first direction, the mesh region is in a target shape, the target shape is different from the first shape, and the target shape includes a polygon shape, a circle shape, or an ellipse shape.



[[Category:C23C14/04]]
[[Category:H10K71/16]]
[[Category:CPC_C23C14/042]]