View source for 18519405. INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

=INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM=


==Organization Name==

[[:Category:TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.|TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]


[[Category:TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]

==Inventor(s)==

[[:Category:Ke-Ying Su of Taipei City (TW)|Ke-Ying Su of Taipei City (TW)]][[Category:Ke-Ying Su of Taipei City (TW)]]

[[:Category:Ke-Wei Su of Zhubei City (TW)|Ke-Wei Su of Zhubei City (TW)]][[Category:Ke-Wei Su of Zhubei City (TW)]]

[[:Category:Keng-Hua Kuo of Hsinchu (TW)|Keng-Hua Kuo of Hsinchu (TW)]][[Category:Keng-Hua Kuo of Hsinchu (TW)]]

[[:Category:Lester Chang of Hsinchu (TW)|Lester Chang of Hsinchu (TW)]][[Category:Lester Chang of Hsinchu (TW)]]

==INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18519405 titled 'INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM

==Simplified Explanation==

The method described in the abstract involves generating an IC layout diagram by configuring a delta resistance network based on the location of a gate via position and performing a simulation based on this network.

* The method involves receiving an IC layout diagram with an active region, gate region, and gate via.
* Configuring a delta resistance network based on the edges of the active region and resistance values determined by the location of the gate via.
* Performing a simulation based on the delta resistance network to analyze the electrical characteristics of the IC layout.

== Potential Applications ==
This technology could be applied in the semiconductor industry for designing and optimizing integrated circuit layouts.

== Problems Solved ==
This technology helps in analyzing and optimizing the electrical performance of IC layouts, ensuring efficient operation of the integrated circuits.

== Benefits ==
The method provides a systematic approach to analyze the impact of gate via positioning on the electrical characteristics of IC layouts, leading to improved design efficiency.

== Potential Commercial Applications ==
* "Optimizing Gate Via Positioning for Enhanced IC Layout Performance"

== Possible Prior Art ==
There may be prior art related to methods for analyzing and optimizing the electrical characteristics of IC layouts, but specific examples are not provided in the abstract.

=== Unanswered Questions ===

=== How does this method compare to existing techniques for analyzing IC layout performance? ===
This article does not provide a comparison with existing techniques for analyzing IC layout performance. 

=== What are the specific parameters used to determine the resistance values in the delta resistance network? ===
The abstract mentions resistance values based on the location and first and second edges, but does not specify the exact parameters used for this determination.


==Original Abstract Submitted==

A method of generating an IC layout diagram includes receiving the IC layout diagram including an active region, a gate region extending across the active region from a first active region edge to a second active region edge, and a gate via positioned at a location along the gate region between the first and second edges, configuring a delta resistance network including the first and second edges, a midpoint between the first and second edges, and resistance values based on the location and first and second edges, and performing a simulation based on the delta resistance network.



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[[Category:G06F30/20]]