View source for 18512324. CONSUMABLE COMPONENT TREATING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT simplified abstract (SEMES CO., LTD.)

=CONSUMABLE COMPONENT TREATING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT=


==Organization Name==

[[:Category:SEMES CO., LTD.|SEMES CO., LTD.]]


[[Category:SEMES CO., LTD.]]

==Inventor(s)==

[[:Category:SUN IL Kim of Chungcheongnam-do (KR)|SUN IL Kim of Chungcheongnam-do (KR)]][[Category:SUN IL Kim of Chungcheongnam-do (KR)]]

==CONSUMABLE COMPONENT TREATING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18512324 titled 'CONSUMABLE COMPONENT TREATING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT

'''Simplified Explanation:'''
The patent application describes a consumable component treating apparatus designed to ensure coating thickness uniformity in semiconductor manufacturing equipment. 

* The apparatus includes a housing, a process gas providing unit, a plasma generating unit, a holder for fixing a base material, a metal substrate for supporting the holder, and a support module for supporting a target material coated on a base material using plasma.

'''Key Features and Innovation:'''
* Consumable component treating apparatus for coating thickness uniformity in semiconductor manufacturing equipment.
* Includes a process gas providing unit, a plasma generating unit, a holder, a metal substrate, and a support module.
* Ensures uniform coating thickness on target materials using plasma technology.

'''Potential Applications:'''
The technology can be applied in semiconductor manufacturing processes, specifically in ensuring uniform coating thickness on target materials.

'''Problems Solved:'''
The technology addresses the challenge of achieving consistent coating thickness in semiconductor manufacturing, which is crucial for product quality and performance.

'''Benefits:'''
* Improved product quality and performance in semiconductor manufacturing.
* Enhanced efficiency and reliability in coating processes.
* Cost-effective solution for ensuring uniform coating thickness.

'''Commercial Applications:'''
The technology can be utilized in semiconductor manufacturing industries for coating processes, leading to improved product quality and performance.

'''Prior Art:'''
Further research can be conducted in the field of plasma technology and its applications in semiconductor manufacturing to explore prior art related to this technology.

'''Frequently Updated Research:'''
Researchers are continually exploring advancements in plasma technology for semiconductor manufacturing to enhance coating processes and product quality.

'''Questions about Consumable Component Treating Apparatus:'''
1. How does the consumable component treating apparatus contribute to ensuring coating thickness uniformity in semiconductor manufacturing?
2. What are the key components of the consumable component treating apparatus and how do they work together to achieve uniform coating thickness?


==Original Abstract Submitted==

Provided is a consumable component treating apparatus for ensuring coating thickness uniformity and a semiconductor manufacturing equipment including the same. The consumable component treating apparatus comprises a housing; a process gas providing unit for providing process gas to an interior of the housing; a plasma generating unit including a high-frequency power source and for generating plasma inside the housing using the process gas; a holder for fixing a base material; a metal substrate for supporting the holder; and a support module for supporting a target material coated on a base material using the plasma.



[[Category:H01J37/34]]
[[Category:C23C14/34]]
[[Category:C23C14/50]]
[[Category:C23C14/54]]
[[Category:H01J37/32]]
[[Category:CPC_H01J37/3435]]