View source for 18509483. SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

=SEMICONDUCTOR DEVICE=


==Organization Name==

[[:Category:SAMSUNG ELECTRONICS CO., LTD.|SAMSUNG ELECTRONICS CO., LTD.]]


[[Category:SAMSUNG ELECTRONICS CO., LTD.]]

==Inventor(s)==

[[:Category:Seonhaeng Lee of Suwon-si (KR)|Seonhaeng Lee of Suwon-si (KR)]][[Category:Seonhaeng Lee of Suwon-si (KR)]]

[[:Category:DONGHEE Son of Suwon-si (KR)|DONGHEE Son of Suwon-si (KR)]][[Category:DONGHEE Son of Suwon-si (KR)]]

==SEMICONDUCTOR DEVICE - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18509483 titled 'SEMICONDUCTOR DEVICE

The semiconductor device described in the abstract features an outer active pattern on a substrate with a trench crossing it, an outer word line covering the trench wall, an inner active pattern covering the outer word line, an inner word line covering the inner active pattern, and a separation insulating pattern between the outer word line and the inner active pattern in the trench. The outer and inner word lines are insulated from each other.

* Outer active pattern on substrate
* Trench crossing the outer active pattern
* Outer word line covering trench wall
* Inner active pattern covering outer word line
* Inner word line covering inner active pattern
* Separation insulating pattern between outer word line and inner active pattern

Potential Applications:
- Semiconductor manufacturing
- Memory devices
- Integrated circuits

Problems Solved:
- Improved insulation between word lines
- Enhanced performance of semiconductor devices

Benefits:
- Higher efficiency in data processing
- Increased reliability of semiconductor devices

Commercial Applications:
Title: Advanced Semiconductor Devices for Enhanced Performance
This technology can be used in the production of memory chips, microprocessors, and other electronic devices, leading to faster and more reliable products in the market.

Questions about the technology:
1. How does the separation insulating pattern improve the performance of the semiconductor device?
   - The separation insulating pattern helps prevent interference between the outer and inner word lines, leading to more reliable operation of the device.
2. What are the key advantages of using inner and outer word lines in the design of semiconductor devices?
   - The use of inner and outer word lines allows for better organization and management of data flow within the device, improving overall efficiency.


==Original Abstract Submitted==

A semiconductor device includes an outer active pattern on a substrate, the outer active pattern having a trench crossing the outer active pattern, an outer word line covering a wall of the trench, an inner active pattern covering the outer word line in the trench, an inner word line covering the inner active pattern in the trench, and a separation insulating pattern interposed between the outer word line and the inner active pattern in the trench. The outer word line and the inner word line are insulated from each other.



[[Category:H01L29/78]]
[[Category:H10B12/00]]
[[Category:CPC_H01L29/7831]]