View source for 18434948. SUBSTRATE PROCESSING APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

=SUBSTRATE PROCESSING APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME=


==Organization Name==

[[:Category:SAMSUNG ELECTRONICS CO., LTD.|SAMSUNG ELECTRONICS CO., LTD.]]


[[Category:SAMSUNG ELECTRONICS CO., LTD.]]

==Inventor(s)==

[[:Category:Seok Heo of Suwon-si (KR)|Seok Heo of Suwon-si (KR)]][[Category:Seok Heo of Suwon-si (KR)]]

[[:Category:Cha Won Koh of Suwon-si (KR)|Cha Won Koh of Suwon-si (KR)]][[Category:Cha Won Koh of Suwon-si (KR)]]

[[:Category:Sang Joon Hong of Suwon-si (KR)|Sang Joon Hong of Suwon-si (KR)]][[Category:Sang Joon Hong of Suwon-si (KR)]]

[[:Category:Hyun Woo Kim of Suwon-si (KR)|Hyun Woo Kim of Suwon-si (KR)]][[Category:Hyun Woo Kim of Suwon-si (KR)]]

[[:Category:Kyung-Won Kang of Suwon-Si (KR)|Kyung-Won Kang of Suwon-Si (KR)]][[Category:Kyung-Won Kang of Suwon-Si (KR)]]

[[:Category:Dong-Wook Kim of Suwon-si (KR)|Dong-Wook Kim of Suwon-si (KR)]][[Category:Dong-Wook Kim of Suwon-si (KR)]]

[[:Category:Kyung Won Seo of Suwon-si (KR)|Kyung Won Seo of Suwon-si (KR)]][[Category:Kyung Won Seo of Suwon-si (KR)]]

[[:Category:Young Il Jang of Suwon-si (KR)|Young Il Jang of Suwon-si (KR)]][[Category:Young Il Jang of Suwon-si (KR)]]

[[:Category:Yong Suk Choi of Suwon-si (KR)|Yong Suk Choi of Suwon-si (KR)]][[Category:Yong Suk Choi of Suwon-si (KR)]]

==SUBSTRATE PROCESSING APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18434948 titled 'SUBSTRATE PROCESSING APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

The patent application describes a substrate processing apparatus that includes a photoresist coater, a humidifier, and an exposer.

* The photoresist coater applies a photoresist film on a substrate.
* The humidifier increases the amount of moisture in the ambient where the photoresist film is exposed.
* The exposer irradiates the photoresist film with light after exposure to the humidified ambient.
* The humidifier is positioned between the photoresist coater and the exposer.

Potential Applications:
- Semiconductor manufacturing
- Microelectronics fabrication
- Photolithography processes

Problems Solved:
- Improved adhesion of photoresist film on substrates
- Enhanced resolution and quality of patterns in semiconductor devices

Benefits:
- Higher process efficiency
- Better control over photoresist application
- Reduced defects in semiconductor manufacturing

Commercial Applications:
The technology can be utilized in industries such as semiconductor manufacturing, microelectronics, and photolithography for improved production processes and product quality.

Questions about the technology:
1. How does the humidifier impact the quality of the photoresist film?
2. What are the specific advantages of using a humidifier in the substrate processing apparatus?


==Original Abstract Submitted==

A substrate processing apparatus includes a photoresist coater applying a photoresist film on a substrate, a humidifier increasing an amount of moisture in an ambient to which the photoresist film on the substrate is exposed, and an exposer irradiating the photoresist film exposed to the ambient having the increased amount of moisture with light. The humidifier is disposed between the photoresist coater and the exposer.



[[Category:G03F7/00]]
[[Category:G03F7/16]]
[[Category:H01L21/677]]
[[Category:H01L21/687]]
[[Category:CPC_G03F7/70875]]