View source for 18421949. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND simplified abstract (FUJIFILM Corporation)

=ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND=


==Organization Name==

[[:Category:FUJIFILM Corporation|FUJIFILM Corporation]]


[[Category:FUJIFILM Corporation]]

==Inventor(s)==

[[:Category:Takeshi Kawabata of Haibara-gun (JP)|Takeshi Kawabata of Haibara-gun (JP)]][[Category:Takeshi Kawabata of Haibara-gun (JP)]]

[[:Category:Minoru Uemura of Haibara-gun (JP)|Minoru Uemura of Haibara-gun (JP)]][[Category:Minoru Uemura of Haibara-gun (JP)]]

[[:Category:Tomotaka Tsuchimura of Haibara-gun (JP)|Tomotaka Tsuchimura of Haibara-gun (JP)]][[Category:Tomotaka Tsuchimura of Haibara-gun (JP)]]

==ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18421949 titled 'ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND

'''Simplified Explanation:'''
The patent application describes a resin composition that becomes sensitive to actinic rays or radiation, containing a compound that generates an acid upon exposure to light. This composition is used to create patterns on substrates through exposure and development processes.

* Contains a compound that generates an acid upon exposure to actinic rays or radiation
* Has an ionic and zwitterionic structure
* Used to create patterns on substrates through exposure and development processes

'''Potential Applications:'''
- Microelectronics manufacturing
- Photolithography processes
- Printed circuit board production

'''Problems Solved:'''
- Improving precision in pattern formation
- Enhancing efficiency in manufacturing processes
- Increasing sensitivity to actinic rays or radiation

'''Benefits:'''
- Higher resolution in pattern formation
- Faster production times
- Cost-effective manufacturing processes

'''Commercial Applications:'''
Title: Actinic Ray-Sensitive Resin Composition for Advanced Microelectronics Manufacturing
This technology can revolutionize the microelectronics industry by providing a more efficient and precise method for creating intricate patterns on substrates, leading to faster production times and cost savings.

'''Prior Art:'''
Research into actinic ray-sensitive resin compositions for pattern formation in microelectronics manufacturing can be found in various academic journals and patents related to photolithography processes.

'''Frequently Updated Research:'''
Ongoing studies focus on optimizing the composition of actinic ray-sensitive resins for even higher sensitivity and resolution in pattern formation, as well as exploring new applications in emerging technologies.

'''Questions about Actinic Ray-Sensitive Resin Composition:'''
1. How does the compound in the resin composition generate an acid upon exposure to actinic rays or radiation?
2. What are the key differences between ionic and zwitterionic structures in the resin composition?


==Original Abstract Submitted==

An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (I) that generates an acid upon irradiation with actinic rays or radiation and has an ionic structure and a zwitterionic structure. A pattern forming method contains forming an actinic ray-sensitive or radiation-sensitive film on a substrate using the actinic ray-sensitive or radiation-sensitive resin composition, exposing the actinic ray-sensitive or radiation-sensitive film to light; and developing the exposed actinic ray-sensitive or radiation-sensitive film with a developer.



[[Category:G03F7/004]]
[[Category:C07C25/18]]
[[Category:C07C43/225]]
[[Category:C07C309/07]]
[[Category:C07C309/11]]
[[Category:C07C309/12]]
[[Category:C07C309/17]]
[[Category:C07C311/09]]
[[Category:C07C381/12]]
[[Category:C07D327/06]]
[[Category:G03F7/038]]
[[Category:G03F7/039]]
[[Category:CPC_G03F7/0045]]