View source for 18385909. METHOD FOR MONITORING PERFORMANCE OF ECCENTRICITY CORRECTION UNIT AND SUBSTRATE TREATING APPARATUS FOR PERFORMING METHOD simplified abstract (SEMES CO., LTD.)

=METHOD FOR MONITORING PERFORMANCE OF ECCENTRICITY CORRECTION UNIT AND SUBSTRATE TREATING APPARATUS FOR PERFORMING METHOD=


==Organization Name==

[[:Category:SEMES CO., LTD.|SEMES CO., LTD.]]


[[Category:SEMES CO., LTD.]]

==Inventor(s)==

[[:Category:In Ki Jung of Gyeonggi-do (KR)|In Ki Jung of Gyeonggi-do (KR)]][[Category:In Ki Jung of Gyeonggi-do (KR)]]

[[:Category:Jeong Hyup Yu of Gyeonggi-do (KR)|Jeong Hyup Yu of Gyeonggi-do (KR)]][[Category:Jeong Hyup Yu of Gyeonggi-do (KR)]]

[[:Category:Young Joon Han of Chungcheongnam-do (KR)|Young Joon Han of Chungcheongnam-do (KR)]][[Category:Young Joon Han of Chungcheongnam-do (KR)]]

[[:Category:Sung Bum Park of Chungcheongnam-do (KR)|Sung Bum Park of Chungcheongnam-do (KR)]][[Category:Sung Bum Park of Chungcheongnam-do (KR)]]

==METHOD FOR MONITORING PERFORMANCE OF ECCENTRICITY CORRECTION UNIT AND SUBSTRATE TREATING APPARATUS FOR PERFORMING METHOD - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18385909 titled 'METHOD FOR MONITORING PERFORMANCE OF ECCENTRICITY CORRECTION UNIT AND SUBSTRATE TREATING APPARATUS FOR PERFORMING METHOD

==Simplified Explanation==
The patent application describes a method for monitoring the performance of an eccentricity correction unit used in industrial processes. The method involves measuring the eccentricity of a substrate and monitoring the correction unit's performance based on the stored correction data.

==Key Features and Innovation==
* Method for measuring and storing eccentricity correction data
* Monitoring performance degradation of the eccentricity correction unit
* Ensuring substrate eccentricity is within allowable values

==Potential Applications==
This technology can be applied in various industrial processes where precise alignment and correction of substrates are crucial, such as printing, coating, and semiconductor manufacturing.

==Problems Solved==
* Ensures substrates are within allowable eccentricity values
* Monitors and detects performance degradation of the correction unit
* Improves overall quality and efficiency of industrial processes

==Benefits==
* Enhanced accuracy in substrate alignment
* Prevents defects and errors in manufacturing processes
* Increases productivity and reduces downtime

==Commercial Applications==
* Printing industry for precise alignment of printing substrates
* Semiconductor manufacturing for accurate positioning of wafers
* Coating industry for uniform coating application

==Prior Art==
Prior art related to this technology may include patents or research papers on eccentricity correction methods in industrial processes, as well as monitoring systems for industrial equipment performance.

==Frequently Updated Research==
Researchers may be exploring advancements in eccentricity correction algorithms, real-time monitoring systems for industrial equipment, and automated correction methods for substrate alignment.

==Questions about Eccentricity Correction Monitoring==
===How does this method improve industrial processes?===
This method ensures precise alignment of substrates, leading to improved product quality and reduced errors in manufacturing.

===What are the potential challenges in implementing this technology?===
Challenges may include integrating the monitoring system with existing equipment and ensuring accurate calibration of the correction unit.


==Original Abstract Submitted==

A method for monitoring performance of an eccentricity correction unit, the method includes a first operation of measuring eccentricity of a substrate mounted on a support unit and storing an amount of eccentricity correction corrected by the eccentricity correction unit such that measured eccentricity of the substrate is within a preset allowable eccentricity value, and a second operation of monitoring, based on the stored amount of eccentricity correction, performance degradation of the eccentricity correction unit.



[[Category:G01B11/24]]
[[Category:CPC_G01B11/24]]