View source for 18374378. METHOD AND APPARATUS FOR TREATING WASTEWATER simplified abstract (Samsung Electronics Co., Ltd.)

=METHOD AND APPARATUS FOR TREATING WASTEWATER=


==Organization Name==

[[:Category:Samsung Electronics Co., Ltd.|Samsung Electronics Co., Ltd.]]


[[Category:Samsung Electronics Co., Ltd.]]

==Inventor(s)==

[[:Category:Daeok Kim of Suwon-si (KR)|Daeok Kim of Suwon-si (KR)]][[Category:Daeok Kim of Suwon-si (KR)]]

[[:Category:Dongyeun Koh of Daejeon (KR)|Dongyeun Koh of Daejeon (KR)]][[Category:Dongyeun Koh of Daejeon (KR)]]

[[:Category:David Kim of Suwon-si (KR)|David Kim of Suwon-si (KR)]][[Category:David Kim of Suwon-si (KR)]]

[[:Category:Jeong-Un Jang of Daejeon (KR)|Jeong-Un Jang of Daejeon (KR)]][[Category:Jeong-Un Jang of Daejeon (KR)]]

==METHOD AND APPARATUS FOR TREATING WASTEWATER - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18374378 titled 'METHOD AND APPARATUS FOR TREATING WASTEWATER

==Simplified Explanation==

The method disclosed in the patent application involves treating wastewater containing fluorine by applying a vacuum to a membrane unit, injecting wastewater into the unit, recovering hydrofluoric acid gas, injecting sweep gas to discharge remaining gas, and forming metal fluoride through a scrubbing process.

* The method involves applying a vacuum to a membrane unit with a hollow membrane.
* Wastewater is injected into the membrane unit to contact the outer surface of the membrane.
* Hydrofluoric acid gas is recovered by evaporating HF in the wastewater based on the vacuum applied to the inner surface of the membrane.
* The evaporated HF is moved to the inner surface through the membrane.
* Sweep gas is injected to discharge remaining HF gas on the inner surface of the membrane.
* Metal fluoride is formed by reacting the recovered HF gas with a metal oxide or metal hydroxide using a scrubbing process.

== Potential Applications ==
This technology can be applied in industrial wastewater treatment plants, particularly those dealing with fluoride contamination.

== Problems Solved ==
This method effectively removes fluorine from wastewater, preventing environmental contamination and health hazards associated with fluoride exposure.

== Benefits ==
The method offers a cost-effective and efficient way to treat wastewater containing fluorine, reducing the environmental impact of industrial processes.

== Potential Commercial Applications ==
The technology can be utilized in industries such as semiconductor manufacturing, metal processing, and chemical production for wastewater treatment.

== Possible Prior Art ==
Prior methods of treating wastewater containing fluorine may involve chemical precipitation or ion exchange processes, which may not be as efficient or cost-effective as the method described in this patent application.

=== Unanswered Questions ===

=== How does this method compare to traditional fluorine removal techniques in terms of cost and efficiency? ===
The article does not provide a direct comparison between this method and traditional fluorine removal techniques. Further research or testing may be needed to determine the cost-effectiveness and efficiency of this method compared to existing technologies.

=== What are the potential environmental impacts of using this technology on a large scale? ===
The article does not address the potential environmental impacts of implementing this technology on a larger scale. Additional studies or assessments may be necessary to evaluate the environmental implications of widespread adoption of this method.


==Original Abstract Submitted==

A method for treating wastewater containing fluorine is disclosed. The method for treating wastewater includes applying a vacuum to a membrane unit including a membrane having a hollow, injecting wastewater into the membrane unit so that the wastewater contacts an outer surface of the membrane, recovering hydrofluoric acid gas by evaporating hydrofluoric acid (HF) in the wastewater based on a vacuum applied to the inner surface of the membrane and moving the evaporated hydrofluoric acid (HF) to the inner surface through the membrane, injecting sweep gas into the membrane unit to discharge hydrofluoric acid gas remaining on the inner surface of the membrane, and forming a metal fluoride by reacting the recovered hydrofluoric acid gas with a metal oxide or metal hydroxide using a scrubbing process.



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