View source for 18284242. DISTORTION RESISTANCE FILM AND PRESSURE SENSOR simplified abstract (TDK CORPORATION)

=DISTORTION RESISTANCE FILM AND PRESSURE SENSOR=


==Organization Name==

[[:Category:TDK CORPORATION|TDK CORPORATION]]


[[Category:TDK CORPORATION]]

==Inventor(s)==

[[:Category:Kohei Nawaoka of Tokyo (JP)|Kohei Nawaoka of Tokyo (JP)]][[Category:Kohei Nawaoka of Tokyo (JP)]]

[[:Category:Ken Unno of Tokyo (JP)|Ken Unno of Tokyo (JP)]][[Category:Ken Unno of Tokyo (JP)]]

[[:Category:Tetsuya Sasahara of Tokyo (JP)|Tetsuya Sasahara of Tokyo (JP)]][[Category:Tetsuya Sasahara of Tokyo (JP)]]

[[:Category:Masanori Kobayashi of Tokyo (JP)|Masanori Kobayashi of Tokyo (JP)]][[Category:Masanori Kobayashi of Tokyo (JP)]]

==DISTORTION RESISTANCE FILM AND PRESSURE SENSOR - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18284242 titled 'DISTORTION RESISTANCE FILM AND PRESSURE SENSOR

==Simplified Explanation==

The abstract describes a patent application for a distortion resistance film made of CrAlN, which can reduce property changes when composition changes occur. This film is used in pressure sensors.

* The distortion resistance film is represented by the formula CrAlN.
* Composition regions of x and y satisfy 25<x≤50 and 0.1<y≤20, respectively.

== Potential Applications ==
The technology can be applied in various industries such as automotive, aerospace, and manufacturing for pressure sensors and other devices requiring distortion resistance films.

== Problems Solved ==
1. Property changes accompanying composition changes are reduced.
2. Pressure sensors can operate more effectively and accurately.

== Benefits ==
1. Improved performance and durability of pressure sensors.
2. Enhanced reliability in various applications.
3. Cost-effective solution for maintaining stability in composition changes.

== Potential Commercial Applications ==
Optimizing Pressure Sensors with CrAlN Distortion Resistance Film

== Possible Prior Art ==
There may be prior art related to distortion resistance films in pressure sensors or other similar applications, but specific examples are not provided in the abstract.

=== Unanswered Questions ===

== How does the CrAlN film compare to other distortion resistance films in terms of performance and cost-effectiveness? ==
The article does not provide a direct comparison with other distortion resistance films, leaving the reader to wonder about the specific advantages of CrAlN over existing options.

== Are there any limitations or challenges in implementing the CrAlN film in pressure sensors or other devices? ==
The abstract does not mention any potential drawbacks or obstacles that may arise when using the CrAlN film, leaving room for further exploration of its practical applications.


==Original Abstract Submitted==

A distortion resistance film is capable of reducing a property change accompanying a composition change and a pressure sensor uses the distortion resistance film. The distortion resistance film is represented by a formula CrAlN, in which composition regions of x and y satisfy 25<x≤50 and 0.1<y≤20, respectively.



[[Category:G01L9/00]]