View source for 18275811. LIGHT-EMITTING PANEL AND PREPARATION METHOD THEREFOR, AND LIGHT-EMITTING APPARATUS simplified abstract (BOE TECHNOLOGY GROUP CO., LTD.)

=LIGHT-EMITTING PANEL AND PREPARATION METHOD THEREFOR, AND LIGHT-EMITTING APPARATUS=


==Organization Name==

[[:Category:BOE TECHNOLOGY GROUP CO., LTD.|BOE TECHNOLOGY GROUP CO., LTD.]]


[[Category:BOE TECHNOLOGY GROUP CO., LTD.]]

==Inventor(s)==

[[:Category:Jun Liu of Beijing (CN)|Jun Liu of Beijing (CN)]][[Category:Jun Liu of Beijing (CN)]]

[[:Category:Jun Wang of Beijing (CN)|Jun Wang of Beijing (CN)]][[Category:Jun Wang of Beijing (CN)]]

[[:Category:Ning Liu of Beijing (CN)|Ning Liu of Beijing (CN)]][[Category:Ning Liu of Beijing (CN)]]

[[:Category:Tongshang Su of Beijing (CN)|Tongshang Su of Beijing (CN)]][[Category:Tongshang Su of Beijing (CN)]]

[[:Category:Haidong Wang of Beijing (CN)|Haidong Wang of Beijing (CN)]][[Category:Haidong Wang of Beijing (CN)]]

[[:Category:Bin Zhou of Beijing (CN)|Bin Zhou of Beijing (CN)]][[Category:Bin Zhou of Beijing (CN)]]

[[:Category:Xuehai Gui of Beijing (CN)|Xuehai Gui of Beijing (CN)]][[Category:Xuehai Gui of Beijing (CN)]]

[[:Category:Rong Liu of Beijing (CN)|Rong Liu of Beijing (CN)]][[Category:Rong Liu of Beijing (CN)]]

==LIGHT-EMITTING PANEL AND PREPARATION METHOD THEREFOR, AND LIGHT-EMITTING APPARATUS - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18275811 titled 'LIGHT-EMITTING PANEL AND PREPARATION METHOD THEREFOR, AND LIGHT-EMITTING APPARATUS

==Simplified Explanation==

The patent application describes a light-emitting panel with a barrier structure in the isolation area adjacent to the light-emitting area. The barrier structure includes four isolation patterns arranged in a stacked manner, with the first isolation pattern closest to the base substrate.

* The light-emitting panel includes a base substrate and a barrier structure.
* The barrier structure is located in the isolation area and consists of four isolation patterns stacked on top of each other.
* The first isolation pattern is closest to the base substrate, with the fourth isolation pattern furthest away.
* The orthographic projections of the isolation patterns on the substrate are arranged in a specific manner.

== Potential Applications ==
The technology described in the patent application could be applied in:
* LED displays
* Lighting fixtures
* Electronic signage

== Problems Solved ==
This technology helps in:
* Preventing light leakage between the light-emitting area and the isolation area
* Enhancing the efficiency and performance of light-emitting panels

== Benefits ==
The benefits of this technology include:
* Improved light emission control
* Enhanced durability and longevity of light-emitting panels
* Better overall performance and visual quality

== Potential Commercial Applications ==
The potential commercial applications of this technology could be in:
* Consumer electronics
* Automotive lighting
* Architectural lighting

== Possible Prior Art ==
One possible prior art for this technology could be the use of barrier structures in OLED displays to prevent cross-talk between pixels.

=== Unanswered Questions ===

== How does the barrier structure impact the overall brightness of the light-emitting panel? ==
The patent application does not provide specific details on how the barrier structure affects the brightness of the panel. Further research or experimentation may be needed to determine this impact.

== What materials are used in the construction of the barrier structure? ==
The patent application does not mention the specific materials used in the barrier structure. Understanding the materials could provide insights into the durability and performance of the light-emitting panel.


==Original Abstract Submitted==

A light-emitting panel has a light-emitting area and an isolation area adjacent to the light-emitting area The light-emitting panel comprises a base substrate and a barrier structure, wherein the barrier structure is arranged on one side of the base substrate and located in the isolation area, and comprises a first isolation pattern, a second isolation pattern, a third isolation pattern and a fourth isolation pattern, which are sequentially arranged in a stacked manner, and the first isolation pattern is closer to the base substrate than the fourth isolation pattern; and an orthographic projection of the first isolation pattern on the substrate is located in an orthographic projection of the second isolation pattern on the base substrate, and an orthographic projection of the third isolation pattern on the base substrate is located in an orthographic projection of the fourth isolation pattern on the base substrate.



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