View source for 18239101. DEPOSITION APPARATUS simplified abstract (Samsung Display Co., LTD.)

=DEPOSITION APPARATUS=


==Organization Name==

[[:Category:Samsung Display Co., LTD.|Samsung Display Co., LTD.]]


[[Category:Samsung Display Co., LTD.]]

==Inventor(s)==

[[:Category:Jongyoon Lee of Yongin-si (KR)|Jongyoon Lee of Yongin-si (KR)]][[Category:Jongyoon Lee of Yongin-si (KR)]]

[[:Category:Sok Won Noh of Yongin-si (KR)|Sok Won Noh of Yongin-si (KR)]][[Category:Sok Won Noh of Yongin-si (KR)]]

[[:Category:Junhyeuk Ko of Yongin-si (KR)|Junhyeuk Ko of Yongin-si (KR)]][[Category:Junhyeuk Ko of Yongin-si (KR)]]

==DEPOSITION APPARATUS - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18239101 titled 'DEPOSITION APPARATUS

==Simplified Explanation==

- Deposition apparatus includes a chamber, a deposition source with nozzles in a first direction, and a deposition angle limiter.
- The deposition angle limiter has a low-incident angle limiting plate between adjacent nozzles and a high-incident angle limiting plate around a portion of a nozzle.
- The first nozzle extends in a height direction.

**Potential Applications:**
- Semiconductor manufacturing
- Thin film deposition
- Solar cell production

**Problems Solved:**
- Control of deposition angles
- Prevention of unwanted deposition on adjacent areas
- Improving overall deposition accuracy

**Benefits:**
- Enhanced precision in deposition processes
- Reduction in material waste
- Increased efficiency in manufacturing operations


==Original Abstract Submitted==

A deposition apparatus includes: a chamber; a deposition source disposed in the chamber to include nozzles arranged in a first direction; and a deposition angle limiter disposed on the deposition source in the chamber. The deposition angle limiter includes: a low-incident angle limiting plate disposed between adjacent first and second nozzles among the nozzles and spaced apart from the first nozzle by a first height in a height direction intersecting the first direction; and a high-incident angle limiting plate surrounding at least a portion of the first nozzle and spaced apart from the first nozzle by a second height in the height direction. The first nozzle extends in the height direction.



[[Category:C23C14/24]]
[[Category:C23C14/04]]