View source for 18198482. SUBSTRATE TEMPERATURE MEASURING DEVICE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE TEMPERATURE MEASURING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)

=SUBSTRATE TEMPERATURE MEASURING DEVICE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE TEMPERATURE MEASURING METHOD USING THE SAME=


==Organization Name==

[[:Category:Samsung Electronics Co., Ltd.|Samsung Electronics Co., Ltd.]]


[[Category:Samsung Electronics Co., Ltd.]]

==Inventor(s)==

[[:Category:Yeon Tae Kim of Suwon-si (KR)|Yeon Tae Kim of Suwon-si (KR)]][[Category:Yeon Tae Kim of Suwon-si (KR)]]

[[:Category:Hun Yong Park of Suwon-si (KR)|Hun Yong Park of Suwon-si (KR)]][[Category:Hun Yong Park of Suwon-si (KR)]]

[[:Category:Yihwan Kim of Suwon-si (KR)|Yihwan Kim of Suwon-si (KR)]][[Category:Yihwan Kim of Suwon-si (KR)]]

[[:Category:Ji Hoon Kim of Suwon-si (KR)|Ji Hoon Kim of Suwon-si (KR)]][[Category:Ji Hoon Kim of Suwon-si (KR)]]

[[:Category:Kee Soo Park of Suwon-si (KR)|Kee Soo Park of Suwon-si (KR)]][[Category:Kee Soo Park of Suwon-si (KR)]]

==SUBSTRATE TEMPERATURE MEASURING DEVICE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE TEMPERATURE MEASURING METHOD USING THE SAME - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18198482 titled 'SUBSTRATE TEMPERATURE MEASURING DEVICE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE TEMPERATURE MEASURING METHOD USING THE SAME

==Simplified Explanation==

The abstract describes a substrate temperature measuring device that uses a sensor to detect different amounts of light at different wavelengths emitted by the substrate. The device includes two calculators, one to calculate the temperatures at each wavelength based on the detected light amounts, and another to calculate the emissivity and reflected energy of the substrate based on the calculated temperatures. The temperature of the substrate is then determined using the calculated emissivity and reflected energy.

* The device measures substrate temperature using a sensor and different wavelengths of light.
* It calculates the temperatures at each wavelength based on the detected light amounts.
* It also calculates the emissivity and reflected energy of the substrate based on the calculated temperatures.
* The temperature of the substrate is determined using the calculated emissivity and reflected energy.

Potential applications of this technology:
* Industrial processes where accurate substrate temperature measurement is important, such as semiconductor manufacturing or metal processing.
* Monitoring and controlling the temperature of materials during various manufacturing processes.
* Research and development of new materials or processes that require precise temperature control.

Problems solved by this technology:
* Accurate measurement of substrate temperature, which is crucial for maintaining quality and efficiency in various manufacturing processes.
* Overcoming the limitations of traditional temperature measurement methods, such as contact-based thermocouples or infrared cameras, which may not provide accurate readings or require physical contact with the substrate.

Benefits of this technology:
* Improved accuracy and reliability in substrate temperature measurement.
* Non-contact measurement, eliminating the need for physical contact with the substrate.
* Real-time monitoring and control of substrate temperature, allowing for better process optimization and quality control.


==Original Abstract Submitted==

A substrate temperature measuring device includes a sensor which senses a first amount of light of a first light having a first wavelength, a second amount of light of a second light having a second wavelength, and a third amount of light of a third light having a third wavelength provided from a substrate, a first calculator to calculate a first temperature for the first wavelength, a second temperature for the second wavelength, and a third temperature of the wavelength through the first amount of light, the second amount of light and the third amount of light which are sensed, and a second calculator to calculate emissivity of the substrate and reflected energy of the substrate through the first temperature, the second temperature, and the third temperature, wherein a temperature of the substrate is calculated through the calculated emissivity of the substrate and the reflected energy of the substrate.



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