View source for 18195757. WAFER STORAGE AND TRANSPORT SYSTEM AND METHOD OF OPERATION OF WAFER STORAGE AND TRANSPORT SYSTEM simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

=WAFER STORAGE AND TRANSPORT SYSTEM AND METHOD OF OPERATION OF WAFER STORAGE AND TRANSPORT SYSTEM=


==Organization Name==

[[:Category:SAMSUNG ELECTRONICS CO., LTD.|SAMSUNG ELECTRONICS CO., LTD.]]


[[Category:SAMSUNG ELECTRONICS CO., LTD.]]

==Inventor(s)==

[[:Category:Sang Hyuk Park of Suwong-si (KR)|Sang Hyuk Park of Suwong-si (KR)]][[Category:Sang Hyuk Park of Suwong-si (KR)]]

[[:Category:Youn Gon Oh of Suwong-si (KR)|Youn Gon Oh of Suwong-si (KR)]][[Category:Youn Gon Oh of Suwong-si (KR)]]

[[:Category:Hyuk Kwon of Suwong-si (KR)|Hyuk Kwon of Suwong-si (KR)]][[Category:Hyuk Kwon of Suwong-si (KR)]]

[[:Category:Young-Kyu Kim of Suwong-si (KR)|Young-Kyu Kim of Suwong-si (KR)]][[Category:Young-Kyu Kim of Suwong-si (KR)]]

[[:Category:Ji Hun Kim of Suwong-si (KR)|Ji Hun Kim of Suwong-si (KR)]][[Category:Ji Hun Kim of Suwong-si (KR)]]

[[:Category:Sung-Hoon Lee of Suwong-si (KR)|Sung-Hoon Lee of Suwong-si (KR)]][[Category:Sung-Hoon Lee of Suwong-si (KR)]]

[[:Category:Jeong Kwan Jung of Suwong-si (KR)|Jeong Kwan Jung of Suwong-si (KR)]][[Category:Jeong Kwan Jung of Suwong-si (KR)]]

==WAFER STORAGE AND TRANSPORT SYSTEM AND METHOD OF OPERATION OF WAFER STORAGE AND TRANSPORT SYSTEM - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18195757 titled 'WAFER STORAGE AND TRANSPORT SYSTEM AND METHOD OF OPERATION OF WAFER STORAGE AND TRANSPORT SYSTEM

==Simplified Explanation==

The patent application describes a wafer storage and transport system that includes a ceiling surface with two surfaces, a first traveling rail installed on the second surface, a second traveling rail spaced apart from the first surface in a third direction and extending in a first direction, a transport unit movable along the second traveling rail to transport a FOUP (Front Opening Unified Pod), storage spaces on the first surface to store the FOUP, an interface port on the second surface to temporarily store the FOUP, and an OHT (Overhead Hoist Transfer) movable along the first traveling rail. The transport unit grasps the FOUP from the storage spaces and transports it to the interface port, while the OHT grasps the FOUP from the interface port and transports it to a semiconductor facility.

* The system includes a ceiling surface with two surfaces, a first traveling rail, a second traveling rail, a transport unit, storage spaces, an interface port, and an OHT.
* The first traveling rail is installed on the second surface, while the second traveling rail is spaced apart from the first surface and extends in a first direction.
* The transport unit is movable along the second traveling rail and is responsible for transporting a FOUP.
* The storage spaces are installed on the first surface and can store the FOUP.
* The interface port is installed on the second surface and temporarily stores the FOUP.
* The OHT is movable along the first traveling rail and is used to transport the FOUP from the interface port to a semiconductor facility.

== Potential Applications ==
* Semiconductor manufacturing facilities
* Wafer fabrication plants
* Cleanroom environments

== Problems Solved ==
* Efficient storage and transport of FOUPs
* Minimizing manual handling and potential damage to FOUPs
* Streamlining the movement of FOUPs within a semiconductor facility

== Benefits ==
* Improved efficiency and productivity in wafer storage and transport processes
* Reduced risk of contamination and damage to FOUPs
* Enhanced automation and control in semiconductor manufacturing operations


==Original Abstract Submitted==

A wafer storage and transport system includes a ceiling surface which includes a first surface and a second surface, a first traveling rail installed on the second surface, a second traveling rail which is spaced apart from the first surface in a third direction, and extends in a first direction, a transport unit which is movable in the first direction along the second traveling rail and transports a FOUP, storage spaces installed on the first surface and which may store the FOUP, an interface port installed on the second surface and which temporarily stores the FOUP, and an OHT which is movable along the first traveling rail, wherein the transport unit grasps the FOUP arranged in the storage spaces and transports the FOUP to the interface port, and the OHT grasps the FOUP temporarily stored in the interface port and transports the FOUP to a semiconductor facility.



[[Category:H01L21/677]]