View source for 18137287. SUBSTRATE TREATING APPARATUS simplified abstract (SEMES CO., LTD.)

=SUBSTRATE TREATING APPARATUS=


==Organization Name==

[[:Category:SEMES CO., LTD.|SEMES CO., LTD.]]


[[Category:SEMES CO., LTD.]]

==Inventor(s)==

[[:Category:Young Seo An of Gyeonggi-do (KR)|Young Seo An of Gyeonggi-do (KR)]][[Category:Young Seo An of Gyeonggi-do (KR)]]

[[:Category:Jae Hoon Park of Gyeonggi-do (KR)|Jae Hoon Park of Gyeonggi-do (KR)]][[Category:Jae Hoon Park of Gyeonggi-do (KR)]]

[[:Category:Young Ju Jo of Gyeonggi-do (KR)|Young Ju Jo of Gyeonggi-do (KR)]][[Category:Young Ju Jo of Gyeonggi-do (KR)]]

[[:Category:Kyung Jin Seo of Chungcheongnam-do (KR)|Kyung Jin Seo of Chungcheongnam-do (KR)]][[Category:Kyung Jin Seo of Chungcheongnam-do (KR)]]

[[:Category:Seo Jung Park of Gyeonggi-do (KR)|Seo Jung Park of Gyeonggi-do (KR)]][[Category:Seo Jung Park of Gyeonggi-do (KR)]]

[[:Category:Dae Myeong Lee of Busan (KR)|Dae Myeong Lee of Busan (KR)]][[Category:Dae Myeong Lee of Busan (KR)]]

[[:Category:Jae Hyun Lim of Chungcheongnam-do (KR)|Jae Hyun Lim of Chungcheongnam-do (KR)]][[Category:Jae Hyun Lim of Chungcheongnam-do (KR)]]

[[:Category:Nam Kyu Kim of Chungcheongnam-do (KR)|Nam Kyu Kim of Chungcheongnam-do (KR)]][[Category:Nam Kyu Kim of Chungcheongnam-do (KR)]]

==SUBSTRATE TREATING APPARATUS - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18137287 titled 'SUBSTRATE TREATING APPARATUS

The abstract describes a substrate treating apparatus that includes a spin chuck supporting a substrate, a rinse liquid supply unit, and a bowl member surrounding the spin chuck. The bowl member consists of a first bowl with an inclined surface and an upper base forming a flow passage for supplying rinse liquid towards the inclined surface.

* Spin chuck supporting substrate
* Rinse liquid supply unit
* Bowl member with inclined surface and upper base
* Flow passage for supplying rinse liquid
* Rinse liquid supplied towards inclined surface

Potential Applications:
- Semiconductor manufacturing
- Microelectronics industry
- Optics industry

Problems Solved:
- Efficient substrate cleaning
- Precise rinse liquid supply
- Improved manufacturing processes

Benefits:
- Enhanced substrate quality
- Increased production efficiency
- Reduced contamination risks

Commercial Applications:
Title: Advanced Substrate Cleaning System for Semiconductor Manufacturing
This technology can be used in semiconductor fabrication facilities to improve substrate cleaning processes, leading to higher quality semiconductor products and increased production efficiency. The market implications include cost savings and improved competitiveness in the semiconductor industry.

Prior Art:
Prior art related to this technology may include patents or research papers on substrate cleaning systems, rinse liquid supply mechanisms, and semiconductor manufacturing equipment.

Frequently Updated Research:
Researchers are continually exploring new methods for substrate cleaning and rinse liquid supply in various industries, including semiconductor manufacturing and microelectronics production.

Questions about Substrate Treating Apparatus:
1. How does the inclined surface of the first bowl improve the efficiency of rinse liquid supply?
2. What are the key differences between this substrate treating apparatus and traditional cleaning systems?


==Original Abstract Submitted==

A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; and a bowl member surrounding the spin chuck, wherein the bowl member includes: a first bowl including an inclined surface inclined downward in an outward direction and having an upper surface of which at least a portion has a curvature; and an upper base disposed on the first bowl, a space between the upper surface of the first bowl and a lower surface of the upper base forms a first flow passage and at least a portion of the first flow passage is formed in an arc shape along the upper surface of the first bowl, and the rinse liquid is supplied toward the inclined surface of the first bowl through the first flow passage.



[[Category:H01L21/67]]
[[Category:B08B3/02]]
[[Category:B08B9/093]]
[[Category:H01L21/687]]
[[Category:CPC_H01L21/67051]]