View source for 18125738. SUBSTRATE TREATING APPARATUS simplified abstract (SEMES CO., LTD.)

=SUBSTRATE TREATING APPARATUS=


==Organization Name==

[[:Category:SEMES CO., LTD.|SEMES CO., LTD.]]


[[Category:SEMES CO., LTD.]]

==Inventor(s)==

[[:Category:Young Seo An of Gyeonggi-do (KR)|Young Seo An of Gyeonggi-do (KR)]][[Category:Young Seo An of Gyeonggi-do (KR)]]

[[:Category:Jae Hoon Park of Gyeonggi-do (KR)|Jae Hoon Park of Gyeonggi-do (KR)]][[Category:Jae Hoon Park of Gyeonggi-do (KR)]]

[[:Category:Young Ju Jo of Gyeonggi-do (KR)|Young Ju Jo of Gyeonggi-do (KR)]][[Category:Young Ju Jo of Gyeonggi-do (KR)]]

[[:Category:Kyung Jin Seo of Chungcheongnam-do (KR)|Kyung Jin Seo of Chungcheongnam-do (KR)]][[Category:Kyung Jin Seo of Chungcheongnam-do (KR)]]

[[:Category:Seo Jung Park of Gyeonggi-do (KR)|Seo Jung Park of Gyeonggi-do (KR)]][[Category:Seo Jung Park of Gyeonggi-do (KR)]]

[[:Category:Dae Myeong Lee of Busan (KR)|Dae Myeong Lee of Busan (KR)]][[Category:Dae Myeong Lee of Busan (KR)]]

[[:Category:Jae Hyun Lim of Chungcheongnam-do (KR)|Jae Hyun Lim of Chungcheongnam-do (KR)]][[Category:Jae Hyun Lim of Chungcheongnam-do (KR)]]

[[:Category:Nam Kyu Kim of Chungcheongnam-do (KR)|Nam Kyu Kim of Chungcheongnam-do (KR)]][[Category:Nam Kyu Kim of Chungcheongnam-do (KR)]]

==SUBSTRATE TREATING APPARATUS - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18125738 titled 'SUBSTRATE TREATING APPARATUS

The abstract describes a substrate treating apparatus that includes a spin chuck supporting a substrate, a rinse liquid supply unit, a first bowl with an inclined surface, and a guide part forming a spiral to guide the flow of rinse liquid along the spiral.

* Spin chuck supporting substrate
* Rinse liquid supply unit providing rinse liquid
* First bowl with inclined surface
* Guide part forming a spiral to guide rinse liquid flow
* Enhanced substrate treatment process

Potential Applications:
- Semiconductor manufacturing
- Thin film deposition processes
- Solar panel production

Problems Solved:
- Efficient rinse liquid distribution
- Improved substrate cleaning process

Benefits:
- Enhanced substrate treatment efficiency
- Reduced substrate contamination
- Increased production yield

Commercial Applications:
- Semiconductor industry
- Electronics manufacturing
- Solar energy sector

Questions about the technology:
1. How does the guide part optimize the flow of rinse liquid?
2. What are the specific benefits of using this substrate treating apparatus?

Frequently Updated Research:
- Ongoing studies on optimizing rinse liquid distribution in substrate treatment processes.


==Original Abstract Submitted==

A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; a first bowl including an inclined surface inclined downward in an outward direction of the spin chuck; and a guide part provided on the inclined surface of the first bowl so as to form a spiral surrounding the spin chuck and guiding a flow of the rinse liquid along the spiral.



[[Category:B08B9/093]]
[[Category:B08B3/02]]
[[Category:G03F7/16]]
[[Category:CPC_B08B9/093]]