View source for 17994858. X-RAY REFLECTOMETRY APPARATUS AND METHOD THEREOF FOR MEASURING THREE DIMENSIONAL NANOSTRUCTURES ON FLAT SUBSTRATE simplified abstract (INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE)

=X-RAY REFLECTOMETRY APPARATUS AND METHOD THEREOF FOR MEASURING THREE DIMENSIONAL NANOSTRUCTURES ON FLAT SUBSTRATE=


==Organization Name==

[[:Category:INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE|INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE]]


[[Category:INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE]]

==Inventor(s)==

[[:Category:Bo-Ching He of Hsinchu City (TW)|Bo-Ching He of Hsinchu City (TW)]][[Category:Bo-Ching He of Hsinchu City (TW)]]

[[:Category:Chun-Ting Liu of Taichung City (TW)|Chun-Ting Liu of Taichung City (TW)]][[Category:Chun-Ting Liu of Taichung City (TW)]]

[[:Category:Wei-En Fu of Yangmei City (TW)|Wei-En Fu of Yangmei City (TW)]][[Category:Wei-En Fu of Yangmei City (TW)]]

[[:Category:Wen-Li Wu of Hsinchu City (TW)|Wen-Li Wu of Hsinchu City (TW)]][[Category:Wen-Li Wu of Hsinchu City (TW)]]

==X-RAY REFLECTOMETRY APPARATUS AND METHOD THEREOF FOR MEASURING THREE DIMENSIONAL NANOSTRUCTURES ON FLAT SUBSTRATE - A simplified explanation of the abstract==


This abstract first appeared for US patent application 17994858 titled 'X-RAY REFLECTOMETRY APPARATUS AND METHOD THEREOF FOR MEASURING THREE DIMENSIONAL NANOSTRUCTURES ON FLAT SUBSTRATE

==Simplified Explanation==

The patent application describes an X-ray reflectometry apparatus and method for measuring a three-dimensional nanostructure on a flat substrate.

* X-ray reflectometry apparatus components:
    - X-ray source for emitting X-ray
    - X-ray reflector for reflecting X-ray onto sample surface
    - 2-dimensional X-ray detector for collecting reflecting X-ray signal
    - Two-axis moving device for controlling detector movement on x-axis and z-axis

Potential Applications:
This technology can be used in nanotechnology research, semiconductor manufacturing, and material science for analyzing thin films and nanostructures.

Problems Solved:
This technology allows for non-destructive measurement of three-dimensional nanostructures on flat substrates with high precision and accuracy.

Benefits:
- Accurate measurement of nanostructures
- Non-destructive testing
- High precision and resolution

Potential Commercial Applications:
"Advanced Nanostructure Measurement Technology for Semiconductor Industry"

Possible Prior Art:
Prior art may include other X-ray reflectometry systems used for analyzing thin films and nanostructures on flat substrates.

Unanswered Questions:
1. How does this technology compare to other methods for measuring nanostructures?
2. What are the limitations of this X-ray reflectometry apparatus in terms of sample size and material compatibility?


==Original Abstract Submitted==

This disclosure relates to an X-ray reflectometry apparatus and a method for measuring a three-dimensional nanostructure on a flat substrate. The X-ray reflectometry apparatus comprises an X-ray source, an X-ray reflector, a 2-dimensional X-ray detector, and a two-axis moving device. The X-ray source is for emitting X-ray. The X-ray reflector is configured for reflecting the X-ray onto a sample surface. The 2-dimensional X-ray detector is configured to collect a reflecting X-ray signal from the sample surface. The two-axis moving device is configured to control two-axis directions of the 2-dimensional X-ray detector to move on at least one of x-axis and z-axis with a formula concerning an incident angle of the X-ray with respect to the sample surface for collecting the reflecting X-ray signal.



[[Category:G01N23/20008]]
[[Category:G01B15/04]]