View source for 17961601. SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD FOR A SUBSTRATE PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)

=SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD FOR A SUBSTRATE PROCESSING APPARATUS=


==Organization Name==

[[:Category:Tokyo Electron Limited|Tokyo Electron Limited]]


[[Category:Tokyo Electron Limited]]

==Inventor(s)==

[[:Category:Keisuke Tsugao of Kumamoto (JP)|Keisuke Tsugao of Kumamoto (JP)]][[Category:Keisuke Tsugao of Kumamoto (JP)]]

[[:Category:Yuji Takimoto of Hillsboro OR (US)|Yuji Takimoto of Hillsboro OR (US)]][[Category:Yuji Takimoto of Hillsboro OR (US)]]

==SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD FOR A SUBSTRATE PROCESSING APPARATUS - A simplified explanation of the abstract==


This abstract first appeared for US patent application 17961601 titled 'SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD FOR A SUBSTRATE PROCESSING APPARATUS

==Simplified Explanation==

The substrate processing apparatus described in the patent application includes a gas processing device that eliminates a target component in the gas by supplying a dissolving liquid to a partition plate made of a porous material, and detecting the concentration of the target component. The controller regulates the flow volume of the dissolving liquid based on operation information of the processing units and the detection result of the concentration detection unit.

* Gas processing device with duct, partition plate, liquid supply unit, and concentration detection unit
* Controller regulates flow volume of dissolving liquid based on operation information and detection result

== Potential Applications ==
The technology described in the patent application could be applied in semiconductor manufacturing processes, chemical processing industries, and other fields where precise control of gas composition is required.

== Problems Solved ==
This technology solves the problem of efficiently removing target components from gas streams in substrate processing systems, ensuring high-quality processing results and minimizing environmental impact.

== Benefits ==
- Improved gas processing efficiency
- Enhanced control over gas composition
- Reduced environmental impact

== Potential Commercial Applications ==
The technology could be commercialized for use in semiconductor fabrication facilities, chemical plants, and other industrial settings where gas processing is a critical part of the production process.

== Possible Prior Art ==
One possible prior art for this technology could be gas scrubbers or filters used in industrial applications to remove impurities from gas streams. However, the specific design and control features described in the patent application may represent a novel approach to gas processing.

=== Unanswered Questions ===

=== How does the controller determine the optimal flow volume of the dissolving liquid? ===
The patent application mentions that the controller regulates the flow volume based on operation information and detection results, but it does not provide specific details on the algorithm or methodology used for this determination.

=== What is the expected lifespan of the partition plate made of porous material? ===
While the patent application describes the partition plate as being made of a porous material, it does not mention the durability or longevity of this component in the gas processing device. This could be an important factor in the practical implementation of the technology.


==Original Abstract Submitted==

A substrate processing apparatus includes a plurality of processing units, an exhaust route, a gas processing device, and a controller. The exhaust route is provided where a gas that is discharged from the plurality of processing units. The gas processing device eliminates a target component in the gas and includes a duct, a partition plate, a liquid supply unit, and a concentration detection unit. The duct has a flow path. The partition plate partitions the flow path into a plurality of spaces and is formed of a porous material. The liquid supply unit supplies a dissolving liquid to the partition plate. The concentration detection unit detects a concentration of the target component. The controller regulates a flow volume of the dissolving liquid, based on at least one of operation information that indicates operation states of the plurality of processing units and a detection result of the concentration detection unit.



[[Category:H01L21/306]]
[[Category:C23C16/44]]
[[Category:C23C16/455]]
[[Category:H01L21/67]]