View source for 17879515. METHOD OF OPERATING SCANNING ELECTRON MICROSCOPE (SEM) AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

=METHOD OF OPERATING SCANNING ELECTRON MICROSCOPE (SEM) AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME=


==Organization Name==

[[:Category:SAMSUNG ELECTRONICS CO., LTD.|SAMSUNG ELECTRONICS CO., LTD.]]


[[Category:SAMSUNG ELECTRONICS CO., LTD.]]

==Inventor(s)==

[[:Category:Jaehyung Ahn of Seoul (KR)|Jaehyung Ahn of Seoul (KR)]][[Category:Jaehyung Ahn of Seoul (KR)]]

[[:Category:Kwangeun Kim of Suwon-si (KR)|Kwangeun Kim of Suwon-si (KR)]][[Category:Kwangeun Kim of Suwon-si (KR)]]

[[:Category:Souk Kim of Seoul (KR)|Souk Kim of Seoul (KR)]][[Category:Souk Kim of Seoul (KR)]]

[[:Category:Younghoon Sohn of Seoul (KR)|Younghoon Sohn of Seoul (KR)]][[Category:Younghoon Sohn of Seoul (KR)]]

==METHOD OF OPERATING SCANNING ELECTRON MICROSCOPE (SEM) AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME - A simplified explanation of the abstract==


This abstract first appeared for US patent application 17879515 titled 'METHOD OF OPERATING SCANNING ELECTRON MICROSCOPE (SEM) AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

==Simplified Explanation==

==Abstract==
The abstract describes a scanning electron microscope (SEM) that includes various components such as an electron gun, a deflector, an objective lens, and detectors. It also mentions the use of energy filters to block certain electrons from being detected by the detectors based on their energy levels.

==Patent/Innovation Explanation==
* The patent describes a scanning electron microscope (SEM) with improved electron detection capabilities.
* It includes an electron gun that generates an electron beam, which is then directed towards a wafer using a deflector.
* The objective lens helps focus the electron beam onto the wafer surface.
* The SEM has two detectors that are designed to detect emission electrons emitted from the wafer when the electron beam is irradiated on it.
* A first energy filter is used to block electrons with energy levels below a certain threshold (first energy) from being detected by the first detector.
* Similarly, a second energy filter is used to block electrons with energy levels below another threshold (second energy) from being detected by the second detector.

==Potential Applications==
* Semiconductor industry: The SEM can be used for imaging and analyzing semiconductor wafers, helping in the development and quality control of semiconductor devices.
* Material science: The SEM can be utilized to study the microstructure and composition of various materials, aiding in research and development of new materials.
* Biological research: The SEM can be employed to examine biological samples at high resolution, enabling detailed analysis of cellular structures and interactions.

==Problems Solved==
* Improved electron detection: The use of energy filters allows for more precise detection of emission electrons, filtering out unwanted low-energy electrons.
* Enhanced image quality: By blocking low-energy electrons, the SEM can produce clearer and sharper images, providing better insights into the sample being analyzed.
* Reduction of noise: Filtering out low-energy electrons helps reduce background noise in the detected signals, leading to more accurate and reliable data.

==Benefits==
* Higher accuracy: The energy filters ensure that only electrons with sufficient energy are detected, improving the accuracy of measurements and analysis.
* Improved image resolution: By eliminating low-energy electrons, the SEM can achieve higher image resolution, enabling finer details to be observed.
* Enhanced data interpretation: The use of energy filters helps researchers focus on relevant electron signals, facilitating better interpretation of the data obtained from the SEM.


==Original Abstract Submitted==

A scanning electron microscope (SEM) includes an electron gun, a deflector, an objective lens, first and second detectors each configured to detect emission electrons emitted from the wafer based on the input electron beam being irradiated on the wafer, a first energy filter configured to block electrons having energy less than a first energy among emission electrons emitted from a wafer based on an input electron beam from being detected by the first detector, and a second energy filter configured to block electrons having energy less than second energy among the emission electrons from being detected by the second detector.



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