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Category:H01L21/027
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Pages in category "H01L21/027"
The following 200 pages are in this category, out of 380 total.
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- 17463000. Method of Forming A Semiconductor Device simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17542563. SAM FORMULATIONS AND CLEANING TO PROMOTE QUICK DEPOSITIONS simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)
- 17674575. Photoresist and Method simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 17692561. METHODS FOR DRY PRINTING CARBON NANOTUBE MEMBRANES simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17697019. METHOD OF FORMING A PATTERN simplified abstract (Samsung Electronics Co., Ltd.)
- 17698476. METHOD OF FABRICATING SEMICONDUCTOR DEVICE INCLUDING POROUS DIELECTRIC LAYER AND SEMICONDUCTOR DEVICE FABRICATED THEREBY simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17719622. METHOD OF FORMING A WIRING AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 17733743. METHOD FOR FORMING PHOTORESIST PATTERNS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17736821. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17737810. PHOTORESIST COMPOSITION AND METHODS OF USE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17742667. COMPOUND FOR FORMING HARDMASK, HARDMASK COMPOSITION INCLUDING THE COMPOUND, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE HARDMASK COMPOSITION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17812005. METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17837543. PATTERNING LAYER MODIFICATION USING DIRECTIONAL RADICAL RIBBON BEAM simplified abstract (Applied Materials, Inc.)
- 17838246. SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 17841031. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17847794. METHOD FOR FORMING PHOTORESIST PATTERNS simplified abstract (Samsung Electronics Co., Ltd.)
- 17946355. HARDMASK STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE simplified abstract (NANYA TECHNOLOGY CORPORATION)
- 17950001. Method and Apparatus for In-Situ Dry Development simplified abstract (TOKYO ELECTRON LIMITED)
- 17956919. METHOD OF FORMING A PATTERN OF SEMICONDUCTOR DEVICE OF A SEMICONDUCTOR DEVICE ON A SEMICONDUCTOR SUBSTRATE BY USING AN EXTREME ULTRAVIOLET MASK simplified abstract (Samsung Electronics Co., Ltd.)
- 17985138. MANDREL-PULL-FIRST INTERCONNECT PATTERNING simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)
- 18054348. TRENCH ETCHING PROCESS FOR PHOTORESIST LINE ROUGHNESS IMPROVEMENT simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18064352. INTEGRATED CIRCUIT (IC) DEVICE WITH MULTI-PITCH PATTERN FABRICATED THROUGH CROSS-LINKABLE BLOCK COPOLYMER simplified abstract (Intel Corporation)
- 18064362. MULTI-PITCH PATTERNING THROUGH ONE-STEP FLOW simplified abstract (Intel Corporation)
- 18077809. TWO STEP IMPLANT TO IMPROVE LINE EDGE ROUGHNESS AND LINE WIDTH ROUGHNESS simplified abstract (Applied Materials, Inc.)
- 18077812. TWO STEP IMPLANT TO CONTROL TIP-TO-TIP DISTANCE BETWEEN TRENCHES simplified abstract (Applied Materials, Inc.)
- 18090436. METHODS FOR FORMING SEMICONDUCTOR DEVICES USING MODIFIED PHOTOMASK LAYER simplified abstract (Tokyo Electron Limited)
- 18099357. SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANUFACTURING METHOD THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18110778. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18123095. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18127118. RESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18133933. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18133945. PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18143296. METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18147107. PATTERNING BASED ON IN-SITU FORMATION OF BLOCK COPOYLMER THROUGH DEPROTECTION simplified abstract (Intel Corporation)
- 18147636. ION BEAM LITHOGRAPHY AND NANOENGINEERING simplified abstract (Intel Corporation)
- 18150324. METHOD OF FABRICATING A SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18190763. FACTORY SYSTEM AND METHOD FOR FORMING SEMICONDUCTOR STRUCTURE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18190917. PHOTORESIST AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18203163. METHOD OF CORRECTING OVERLAY, METHOD OF CONTROLLING SEMICONDUCTOR PROCESS, AND SEMICONDUCTOR PROCESSING APPARATUS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18212913. PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18222897. INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTORESIST simplified abstract (Applied Materials, Inc.)
- 18281993. NAPHTHALENE UNIT-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION simplified abstract (NISSAN CHEMICAL CORPORATION)
- 18285141. COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ORGANIZATION simplified abstract (NISSAN CHEMICAL CORPORATION)
- 18300859. ADDITIVE FOR LITHOGRAPHY simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18310073. SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18314566. PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18336859. LITHOGRAPHY SYSTEM AND METHODS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18341124. METHODS OF TRAINING DEEP LEARNING MODELS FOR OPTICAL PROXIMITY CORRECTION, OPTICAL PROXIMITY CORRECTION METHODS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18347129. OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.)
- 18357297. MASK ABSORBER LAYERS FOR EXTREME ULTRAVIOLET LITHOGRAPHY simplified abstract (The Regents of the University of California)
- 18361361. PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18369321. HARDMASK STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE simplified abstract (NANYA TECHNOLOGY CORPORATION)
- 18372212. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18373455. METHOD FOR FABRICATING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18381773. METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18383543. REFLECTIVE MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND A METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18402563. METHOD OF BREAKING THROUGH ETCH STOP LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18404434. PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18404776. MULTILAYER PROTECTION COATING WITH LAYERS OF DIFFERENT FUNCTIONS ON CARBON NANOTUBE (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18407631. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18417830. THIN FILM TRANSISTORS AND RELATED FABRICATION TECHNIQUES simplified abstract (Micron Technology, Inc.)
- 18419879. HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS simplified abstract (Samsung SDI Co., Ltd.)
- 18421783. METHOD AND APPARATUS FOR CONTROLLING DROPLET IN EXTREME ULTRAVIOLET LIGHT SOURCE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18427044. PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
- 18432694. SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18433867. SEMICONDUCTOR DEVICE HAVING CUT GATE DIELECTRIC simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18444356. SEMICONDUCTOR DEVICE WITH HELMET STRUCTURE BETWEEN TWO SEMICONDUCTOR FINS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18447673. PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18448110. METHOD OF USING WAFER STAGE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18454219. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18467389. METHOD FOR FORMING SEMICONDUCTOR DIE (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18470321. PACKAGES WITH LOW-PROFILE POLYIMIDE LAYERS (Texas Instruments Incorporated)
- 18473459. SUBSTRATE TREATMENT METHOD, SUBSTRATE TREATMENT APPARATUS, AND COMPUTER STORAGE MEDIUM simplified abstract (Tokyo Electron Limited)
- 18474849. METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18480249. SEMICONDUCTOR DEVICE MANUFACTURING METHOD, X-RAY DIFFRACTION DEVICE AND SEMICONDUCTOR PATTERN TRANSFER SYSTEM simplified abstract (Mitsubishi Electric Corporation)
- 18483176. METHOD FOR MANUFACTURING PHOTOMASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18493614. DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF simplified abstract (Lam Research Corporation)
- 18496015. SUBSTRATE PROCESSING SYSTEM AND ITS CONTROL METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18496160. PHOTO-CURABLE COMPOSITION AND METHODS FOR PREPARING CURED FILM, OPTICAL COMPONENT, CIRCUIT SUBSTRATE, ELECTRICAL COMPONENT AND REPLICA MOLD USING THE SAME simplified abstract (CANON KABUSHIKI KAISHA)
- 18500662. PATTERN FORMING METHOD, SEMICONDUCTOR MEMORY DEVICE, AND METHOD OF MANUFACTURING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18508566. METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18517275. FLEXIBLE MERGE SCHEME FOR SOURCE/DRAIN EPITAXY REGIONS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18518170. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18524767. FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING simplified abstract (TOKYO ELECTRON LIMITED)
- 18526038. PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18527024. PHOTO MASK AND LITHOGRAPHY METHOD USING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18527056. PHOTORESIST COMPOSITION INCLUDING PHOTOSENSITIVE POLYMER AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18531854. ALIGNMENT APPARATUS AND METHOD OF ALIGNMENT USING THE SAME simplified abstract (Samsung Display Co., LTD.)
- 18535594. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18536373. RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18536373. RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (SAMSUNG SDI CO., LTD.)
- 18582045. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18587218. EXPOSURE MASK, SEMICONDUCTOR DEVICE USING THE EXPOSURE MASK, AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE (SK hynix Inc.)
- 18587825. SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18588447. Resist Underlayer Film Material, Pattern Forming Method, And Method Of Forming Resist Underlayer Film simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18588597. HYDROPHOBIC TREATMENT DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Kioxia Corporation)
- 18597065. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18601848. PROCESSING APPARATUS SEPARATING MULTILAYER MATERIAL, PROCESSING METHOD, AND METHOD FOR MANUFACTURING ARTICLE USING PROCESSING APPARATUS simplified abstract (CANON KABUSHIKI KAISHA)
- 18603679. CLEANING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18604127. METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18605141. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18605484. MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME (SK hynix Inc.)
- 18614266. RESISTOR-CAPACITOR COMPONENT FOR HIGH-VOLTAGE APPLICATIONS AND METHOD FOR MANUFACTURING THEREOF simplified abstract (Murata Manufacturing Co., Ltd.)
- 18616255. CHEMICAL-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING HYDROXYARYL-TERMINATED POLYMER simplified abstract (NISSAN CHEMICAL CORPORATION)
- 18620262. METHODS AND APPARATUS TO REDUCE EXTREME ULTRAVIOLET LIGHT FOR PHOTOLITHOGRAPHY simplified abstract (Intel Corporation)
- 18623816. SEMICONDUCTOR DEVICE (SAMSUNG ELECTRONICS CO., LTD.)
- 18626475. HEAT TREATMENT DEVICE AND TREATMENT METHOD simplified abstract (Tokyo Electron Limited)
- 18627780. CHEMICAL LIQUID STORAGE BODY simplified abstract (FUJIFILM Corporation)
- 18631832. PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18634408. CLEANING SOLUTION AND METHOD OF CLEANING WAFER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18638436. SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18647024. COMPOUND, PATTERNING MATERIAL, SEMICONDUCTOR DEVICE, TERMINAL, AND PATTERNING METHOD simplified abstract (Huawei Technologies Co., Ltd.)
- 18649086. PHOTORESIST LAYER OUTGASSING PREVENTION simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18656987. SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18668432. METHOD FOR PREPARING SEMICONDUCTOR DEVICE STRUCTURE HAVING FEATURES OF DIFFERENT DEPTHS simplified abstract (NANYA TECHNOLOGY CORPORATION)
- 18672076. SEMICONDUCTOR STRUCTURE WITH A BIT LINE IN A DIFFERENT CONFIGURATION THAN A LOCAL INTERCONNECT LINE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.)
- 18675505. LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.)
- 18746320. FORMING APPARATUS, FORMING METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18751841. METHODS FOR FORMING SELF-ALIGNED INTERCONNECT STRUCTURES simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18753766. CONTACT OVER ACTIVE GATE STRUCTURES WITH ETCH STOP LAYERS FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION simplified abstract (Intel Corporation)
- 18817618. Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process (Shin-Etsu Chemical Co., Ltd.)
- 18823843. CURABLE COMPOSITION, FILM FORMING METHOD AND MANUFACTURING METHOD (CANON KABUSHIKI KAISHA)
- 18888227. DISPLAY DEVICE (Semiconductor Energy Laboratory Co., Ltd.)
- 18888480. METHOD FOR PREPARING SEMICONDUCTOR DEVICE STRUCTURE WITH FEATURES AT DIFFERENT LEVELS (NANYA TECHNOLOGY CORPORATION)
- 18940463. METHOD FOR REDUCING CHARGING OF SEMICONDUCTOR WAFERS (Taiwan Semiconductor Manufacturing Company, LTD.)
- 18941798. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (Taiwan Semiconductor Manufacturing Company, LTD.)
- 18961391. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18968046. COATING COMPOSITION FOR PHOTOLITHOGRAPHY (Taiwan Semiconductor Manufacturing Co., Ltd.)
A
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C
- Canon kabushiki kaisha (20240308129). PROCESSING APPARATUS SEPARATING MULTILAYER MATERIAL, PROCESSING METHOD, AND METHOD FOR MANUFACTURING ARTICLE USING PROCESSING APPARATUS simplified abstract
- Canon kabushiki kaisha (20240316488). CLEANING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract
- Canon kabushiki kaisha (20240337923). FORMING APPARATUS, FORMING METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract
- Canon kabushiki kaisha (20250084270). CURABLE COMPOSITION, FILM FORMING METHOD AND MANUFACTURING METHOD
- CANON KABUSHIKI KAISHA patent applications on February 15th, 2024
- CANON KABUSHIKI KAISHA patent applications on February 29th, 2024
- CANON KABUSHIKI KAISHA patent applications on January 23rd, 2025
- CANON KABUSHIKI KAISHA patent applications on March 13th, 2025
- CANON KABUSHIKI KAISHA patent applications on October 10th, 2024
- CANON KABUSHIKI KAISHA patent applications on September 19th, 2024
- CANON KABUSHIKI KAISHA patent applications on September 26th, 2024
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G
H
I
- Innolux corporation (20240295823). METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract
- InnoLux Corporation patent applications on September 5th, 2024
- Intel corporation (20240186378). GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES HAVING EMBEDDED GESNB SOURCE OR DRAIN STRUCTURES simplified abstract
- Intel corporation (20240194483). INTEGRATED CIRCUIT (IC) DEVICE WITH MULTI-PITCH PATTERN FABRICATED THROUGH CROSS-LINKABLE BLOCK COPOLYMER simplified abstract
- Intel corporation (20240194672). MULTI-PITCH PATTERNING THROUGH ONE-STEP FLOW simplified abstract
- Intel corporation (20240222073). ION BEAM LITHOGRAPHY AND NANOENGINEERING simplified abstract
- Intel corporation (20240222119). PATTERNING BASED ON IN-SITU FORMATION OF BLOCK COPOYLMER THROUGH DEPROTECTION simplified abstract
- Intel corporation (20240241446). METHODS AND APPARATUS TO REDUCE EXTREME ULTRAVIOLET LIGHT FOR PHOTOLITHOGRAPHY simplified abstract
- Intel corporation (20240347465). CONTACT OVER ACTIVE GATE STRUCTURES WITH ETCH STOP LAYERS FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION simplified abstract
- Intel Corporation patent applications on February 6th, 2025
- Intel Corporation patent applications on July 18th, 2024
- Intel Corporation patent applications on July 4th, 2024
- Intel Corporation patent applications on June 13th, 2024
- Intel Corporation patent applications on June 6th, 2024
- Intel Corporation patent applications on October 17th, 2024
- International business machines corporation (20240162087). MANDREL-PULL-FIRST INTERCONNECT PATTERNING simplified abstract
- INTERNATIONAL BUSINESS MACHINES CORPORATION patent applications on February 1st, 2024
- INTERNATIONAL BUSINESS MACHINES CORPORATION patent applications on May 16th, 2024
K
- Kioxia corporation (20240319604). HYDROPHOBIC TREATMENT DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
- Kioxia corporation (20240427234). IMPRINT METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Kioxia Corporation patent applications on December 26th, 2024
- Kioxia Corporation patent applications on September 26th, 2024
M
- Micron technology, inc. (20240237364). THIN FILM TRANSISTORS AND RELATED FABRICATION TECHNIQUES simplified abstract
- Micron Technology, Inc. patent applications on July 11th, 2024
- Mitsubishi electric corporation (20240231234). SEMICONDUCTOR DEVICE MANUFACTURING METHOD, X-RAY DIFFRACTION DEVICE AND SEMICONDUCTOR PATTERN TRANSFER SYSTEM simplified abstract
- Mitsubishi Electric Corporation patent applications on July 11th, 2024
- Murata manufacturing co., ltd. (20240321782). RESISTOR-CAPACITOR COMPONENT FOR HIGH-VOLTAGE APPLICATIONS AND METHOD FOR MANUFACTURING THEREOF simplified abstract
- Murata Manufacturing Co., Ltd. patent applications on September 26th, 2024
S
- Samsung display co., ltd. (20240266199). ALIGNMENT APPARATUS AND METHOD OF ALIGNMENT USING THE SAME simplified abstract
- Samsung display co., ltd. (20250008831). APPARATUS AND METHOD OF MANUFACTURING DEPOSITION MASK
- Samsung Display Co., LTD. patent applications on August 8th, 2024
- Samsung Display Co., LTD. patent applications on January 2nd, 2025
- Samsung electronics co., ltd. (20240105694). SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240112915). METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240118627). METHOD OF CORRECTING OVERLAY, METHOD OF CONTROLLING SEMICONDUCTOR PROCESS, AND SEMICONDUCTOR PROCESSING APPARATUS simplified abstract
- Samsung electronics co., ltd. (20240128082). METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240160115). OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract
- Samsung electronics co., ltd. (20240160827). METHODS OF TRAINING DEEP LEARNING MODELS FOR OPTICAL PROXIMITY CORRECTION, OPTICAL PROXIMITY CORRECTION METHODS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240162039). METHOD FOR MANUFACTURING PHOTOMASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240203796). METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240213023). METHOD FOR FABRICATING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240219824). REFLECTIVE MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND A METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240222201). METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240231222). PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240242985). SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240255848). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240266170). PATTERN FORMING METHOD, SEMICONDUCTOR MEMORY DEVICE, AND METHOD OF MANUFACTURING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240280895). METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240282576). METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract