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Category:G03F7/004
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Pages in category "G03F7/004"
The following 200 pages are in this category, out of 249 total.
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- 17638730. QUANTUM DOT LIGHT-EMITTING DEVICE AND MANUFACTURING METHOD THEREOF simplified abstract (BOE TECHNOLOGY GROUP CO., LTD.)
- 17737810. PHOTORESIST COMPOSITION AND METHODS OF USE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17742260. RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17760253. QUANTUM DOTS MATERIAL SOLUTION, METHOD OF FORMING QUANTUM DOTS LAYER, AND ARRAY SUBSTRATE, DISPLAY PANEL, AND METHOD OF FABRICATING DISPLAY PANEL simplified abstract (BOE TECHNOLOGY GROUP CO., LTD.)
- 17826234. POLYMERS FOR PHOTORESIST AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 17841031. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17865936. IONIC SALT, RADIATION-SENSITIVE RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18047030. PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTOACID GENERATOR simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18080348. PHOTO-DECOMPOSABLE COMPOUND, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18112803. FABRICATION OF EUV MASKS USING A COMBINATION OF MONOLAYER LITHOGRAPHY AND AREA SELECTIVE DEPOSITION simplified abstract (International Business Machines Corporation)
- 18123095. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18127118. RESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18133118. METHOD FOR FORMING RESIST PATTERN BY USING EXTREME ULTRAVIOLET LIGHT AND METHOD FOR FORMING PATTERN BY USING THE RESIST PATTERN AS MASK simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18150012. CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION simplified abstract (Samsung Electronics Co., Ltd.)
- 18155955. PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18167741. SWITCHABLE SUBSTRATE FOR EXTREME ULTRAVIOLET OR E-BEAM METALLIC RESIST simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18192316. ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18212913. PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18222897. INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTORESIST simplified abstract (Applied Materials, Inc.)
- 18239301. PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, AND COLOR FILTER simplified abstract (SAMSUNG SDI CO., LTD.)
- 18277589. QUANTUM DOT MIXTURE, QUANTUM DOT LIGHT EMITTING LAYER AND PREPARATION METHOD THEREOF (BOE TECHNOLOGY GROUP CO., LTD.)
- 18298114. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18300859. ADDITIVE FOR LITHOGRAPHY simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18312825. CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18314566. PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18325465. RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18326617. RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18326632. RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18329976. ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18335852. PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18344992. PHOTORESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (Samsung Electronics Co., Ltd.)
- 18361361. PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18371016. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18376925. ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18377215. Onium Salt, Resist Composition, And Patterning Process simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18379860. PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER simplified abstract (SAMSUNG SDI CO., LTD.)
- 18379933. PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER simplified abstract (SAMSUNG SDI CO., LTD.)
- 18381335. THINNER COMPOSITION AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE BY USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18384038. PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, AND COLOR FILTER simplified abstract (SAMSUNG SDI CO., LTD.)
- 18392365. POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE RESIST COMPOSITION (SAMSUNG ELECTRONICS CO., LTD.)
- 18403927. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18404506. ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS simplified abstract (Shin-Etsu Chemical Co., Ltd.)
- 18411364. PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)
- 18411380. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)
- 18416087. SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS simplified abstract (Tokyo Electron Limited)
- 18421949. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND simplified abstract (FUJIFILM Corporation)
- 18426723. SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18435960. PHOTOLITHOGRAPHY PATTERNING METHOD simplified abstract (KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY)
- 18436721. ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18484247. SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (SAMSUNG SDI CO., LTD.)
- 18490857. SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18491310. RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18503696. PHOTOACID GENERATOR simplified abstract (International Business Machines Corporation)
- 18514254. MULTI-METAL FILL WITH SELF-ALIGNED PATTERNING AND DIELECTRIC WITH VOIDS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18536373. RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18536373. RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (SAMSUNG SDI CO., LTD.)
- 18546879. HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS THEREOF simplified abstract (Lam Research Corporation)
- 18578627. METHOD OF FORMING PATTERNS simplified abstract (Samsung SDI Co., Ltd.)
- 18581290. EUV SENSITIVE METAL OXIDE MATERIAL AS UNDERLAYER FOR THIN CAR TO IMPROVE PATTERN TRANSFER simplified abstract (Applied Materials, Inc.)
- 18586593. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND simplified abstract (FUJIFILM Corporation)
- 18589918. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18590436. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18590834. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18597253. ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18601039. CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18601043. CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18609833. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18610609. METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUCING PHOTOSENSITIVE COMPOSITION simplified abstract (FUJIFILM Corporation)
- 18610965. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN simplified abstract (FUJIFILM Corporation)
- 18613810. ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST PATTERN simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18615313. FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVERCOAT (Tokyo Electron Limited)
- 18626079. MICRO PATTERN MANUFACTURING METHOD USING PHOTOSENSITIVE RESIN COMPOUND simplified abstract (CANON KABUSHIKI KAISHA)
- 18627130. PHOTOSENSITIVE PASTE AND METHOD FOR PRODUCING ELECTRONIC COMPONENTS simplified abstract (Murata Manufacturing Co., Ltd.)
- 18627780. CHEMICAL LIQUID STORAGE BODY simplified abstract (FUJIFILM Corporation)
- 18631832. PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18647024. COMPOUND, PATTERNING MATERIAL, SEMICONDUCTOR DEVICE, TERMINAL, AND PATTERNING METHOD simplified abstract (Huawei Technologies Co., Ltd.)
- 18667993. FLOW CELLS simplified abstract (ILLUMINA, INC.)
- 18738731. METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS (Applied Materials, Inc.)
- 18740139. STRUCTURES FOR PATTERNING AND RELATED METHODS AND SYSTEMS (ASM IP Holding B.V.)
- 18746861. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUNDS simplified abstract (FUJIFILM Corporation)
- 18769038. PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES (LAM RESEARCH CORPORATION)
- 18777777. PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING A PHOTORESIST COMPOSITION (SAMSUNG ELECTRONICS CO., LTD.)
- 18793603. SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION (SAMSUNG SDI CO., LTD.)
- 18806898. CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS (Shin-Etsu Chemical Co., Ltd.)
- 18808397. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, COMPOUND, AND RESIN (FUJIFILM CORPORATION)
- 18808427. ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE (FUJIFILM CORPORATION)
- 18890487. RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION (SAMSUNG SDI CO., LTD.)
- 18941798. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (Taiwan Semiconductor Manufacturing Company, LTD.)
- 18961391. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18964266. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN (Taiwan Semiconductor Manufacturing Co., Ltd.)
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- Applied materials, inc. (20240419081). METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS
- Applied Materials, Inc. patent applications on December 19th, 2024
- Applied Materials, Inc. patent applications on February 13th, 2025
- Applied Materials, Inc. patent applications on January 23rd, 2025
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- Fujifilm corporation (20240241443). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract
- Fujifilm corporation (20240241444). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract
- Fujifilm corporation (20240280362). METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUCING PHOTOSENSITIVE COMPOSITION simplified abstract
- Fujifilm corporation (20240337931). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUNDS simplified abstract
- Fujifilm corporation (20240427242). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
- Fujifilm corporation (20240427243). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
- Fujifilm corporation (20250004374). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
- Fujifilm corporation (20250004377). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
- FUJIFILM Corporation patent applications on August 22nd, 2024
- FUJIFILM CORPORATION patent applications on December 26th, 2024
- FUJIFILM CORPORATION patent applications on January 2nd, 2025
- FUJIFILM Corporation patent applications on July 18th, 2024
- FUJIFILM Corporation patent applications on October 10th, 2024
H
I
- Intel corporation (20240201586). PRECURSORS AND METHODS FOR PRODUCING TIN-BASED PHOTORESIST simplified abstract
- Intel corporation (20240272547). TIN CARBOXYLATE PRECURSORS FOR METAL OXIDE RESIST LAYERS AND RELATED METHODS simplified abstract
- Intel Corporation patent applications on August 15th, 2024
- Intel Corporation patent applications on February 13th, 2025
- Intel Corporation patent applications on June 20th, 2024
- INTEL CORPORATION patent applications on June 20th, 2024
- International business machines corporation (20240280899). FABRICATION OF EUV MASKS USING A COMBINATION OF MONOLAYER LITHOGRAPHY AND AREA SELECTIVE DEPOSITION simplified abstract
- International Business Machines Corporation patent applications on August 22nd, 2024
- International Business Machines Corporation patent applications on February 29th, 2024
M
S
- SAMSUNG DISPLAY CO., LTD. patent applications on February 8th, 2024
- Samsung electronics co., ltd. (20240094633). CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240199540). CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240201588). ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240210832). PHOTORESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240231222). PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240231223). RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240231225). RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240231228). RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240239820). ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMING METHOD USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240241438). PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240255845). PHOTORESIST COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240255847). ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240255848). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240288771). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240310724). PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240319592). RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240319593). THINNER COMPOSITION AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE BY USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240327338). ORGANIC SALT, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240337928). ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST PATTERN simplified abstract
- Samsung electronics co., ltd. (20240377740). POSITIVE TYPE PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIST PATTERN, AND CURED FILM simplified abstract
- Samsung electronics co., ltd. (20250004370). POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE RESIST COMPOSITION
- Samsung electronics co., ltd. (20250020997). PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME
- Samsung electronics co., ltd. (20250020998). PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME
- Samsung electronics co., ltd. (20250021003). POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME
- Samsung electronics co., ltd. (20250093772). PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING A PHOTORESIST COMPOSITION
- Samsung electronics co., ltd. (20250102906). ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION
- Samsung Electronics Co., Ltd. patent applications on August 1st, 2024
- Samsung Electronics Co., Ltd. patent applications on August 29th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on August 29th, 2024
- Samsung Electronics Co., Ltd. patent applications on February 29th, 2024
- Samsung Electronics Co., Ltd. patent applications on February 6th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on February 8th, 2024
- Samsung Electronics Co., Ltd. patent applications on January 16th, 2025
- Samsung Electronics Co., Ltd. patent applications on January 2nd, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on January 2nd, 2025
- Samsung Electronics Co., Ltd. patent applications on July 11th, 2024
- Samsung Electronics Co., Ltd. patent applications on July 18th, 2024
- Samsung Electronics Co., Ltd. patent applications on June 20th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on June 20th, 2024
- Samsung Electronics Co., Ltd. patent applications on June 27th, 2024
- Samsung Electronics Co., Ltd. patent applications on March 20th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 20th, 2025
- Samsung Electronics Co., Ltd. patent applications on March 21st, 2024
- Samsung Electronics Co., Ltd. patent applications on March 27th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 27th, 2025
- Samsung Electronics Co., Ltd. patent applications on November 14th, 2024
- Samsung Electronics Co., Ltd. patent applications on October 10th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on October 10th, 2024
- Samsung Electronics Co., Ltd. patent applications on October 3rd, 2024
- Samsung Electronics Co., Ltd. patent applications on September 19th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on September 19th, 2024
- Samsung Electronics Co., Ltd. patent applications on September 26th, 2024
- Samsung sdi co., ltd. (20240241437). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung sdi co., ltd. (20240319601). METHOD OF FORMING PATTERNS simplified abstract
- Samsung sdi co., ltd. (20240345477). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung sdi co., ltd. (20240345478). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung sdi co., ltd. (20250068066). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
- Samsung sdi co., ltd. (20250093777). RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
- SAMSUNG SDI CO., LTD. patent applications on February 27th, 2025
- SAMSUNG SDI CO., LTD. patent applications on February 6th, 2025
- SAMSUNG SDI CO., LTD. patent applications on July 18th, 2024
- SAMSUNG SDI CO., LTD. patent applications on March 20th, 2025
- Samsung SDI Co., Ltd. patent applications on October 17th, 2024
- Samsung SDI Co., Ltd. patent applications on September 26th, 2024
- Shin-etsu chemical co., ltd. (20240337927). ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS simplified abstract
- Shin-etsu chemical co., ltd. (20240337939). CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS simplified abstract
- SHIN-ETSU CHEMICAL CO., LTD. patent applications on October 10th, 2024
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- Taiwan semiconductor manufacturing co., ltd. (20240096623). METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240329535). DOSE REDUCTION BOTTOM ANTI-REFLECTIVE COATING FOR METALLIC PHOTORESIST simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240419069). PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS