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Category:G03F1/52
Subcategories
This category has the following 4 subcategories, out of 4 total.
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Pages in category "G03F1/52"
The following 9 pages are in this category, out of 9 total.
1
- 18313203. METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AREA OF HIGH-NA EUV EXPOSURE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18517796. REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK simplified abstract (AGC Inc.)
- 18823930. REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK (SHIN-ETSU CHEMICAL CO., LTD.)
T
- Taiwan semiconductor manufacturing co., ltd. (20240248387). METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AREA OF HIGH-NA EUV EXPOSURE simplified abstract
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on July 25th, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240377720). EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240377722). MASK AND METHOD OF FORMING THE SAME simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024