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Category:C23C16/40
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This category has the following 67 subcategories, out of 67 total.
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Pages in category "C23C16/40"
The following 121 pages are in this category, out of 121 total.
1
- 17859214. YTTRIUM COMPOUND AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 17908798. SEMICONDUCTOR MANUFACTURING APPARATUS AND CLEANING METHOD OF SEMICONDUCTOR MANUFACTURING APPARATUS simplified abstract (Hitachi High-Tech Corporation)
- 18071391. MATERIALS ENGINEERING FOR ANTI-COKING COATING STACKS simplified abstract (Applied Materials, Inc.)
- 18090553. METHODS OF PRODUCING COMPOSITE VEHICLE BRAKING COMPONENTS INCLUDING ALUMINUM ALLOYS simplified abstract (GM GLOBAL TECHNOLOGY OPERATIONS LLC)
- 18099459. ATOMIC LAYER DEPOSITION OF RUTHENIUM OXIDE COATINGS simplified abstract (Applied Materials, Inc.)
- 18109365. ELECTRONIC DEVICE FABRICATION USING AREA-SELECTIVE DEPOSITION simplified abstract (Applied Materials, Inc.)
- 18119432. ULTRA HIGH-K HAFNIUM OXIDE AND HAFNIUM ZIRCONIUM OXIDE FILMS simplified abstract (Applied Materials, Inc.)
- 18119432. ULTRA HIGH-K HAFNIUM OXIDE AND HAFNIUM ZIRCONIUM OXIDE FILMS simplified abstract (The Regents of the University of California)
- 18149829. SELECTIVE METAL SELECTIVITY IMPROVEMENT WITH RF PULSING simplified abstract (Applied Materials, Inc.)
- 18161045. HIGH QUALITY INSITU TREATED PECVD FILM simplified abstract (Texas Instruments Incorporated)
- 18166196. SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18181077. SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES simplified abstract (Applied Materials, Inc.)
- 18183760. VANADIUM OXIDE-BASED ELECTRODE FOR ELECTROCHEMICAL WATER SPLITTING AND METHOD OF PREPARATION THEREOF simplified abstract (KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS)
- 18206187. PROCESS OF FORMING SILICON-CONTAINING FILM AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18219368. ATOMIC LAYER DEPOSITION METHODS FOR MAKING OMNIDIRECTIONAL STRUCTURAL COLOR MULTILAYER STRUCTURES (TOYOTA JIDOSHA KABUSHIKI KAISHA)
- 18219368. ATOMIC LAYER DEPOSITION METHODS FOR MAKING OMNIDIRECTIONAL STRUCTURAL COLOR MULTILAYER STRUCTURES (Toyota Motor Engineering & Manufacturing North America, Inc.)
- 18228220. METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18244694. RARE EARTH-PHOSPHATE-ENHANCED THERMAL BARRIER COATING (RTX CORPORATION)
- 18291532. SELECTIVE DEPOSITION OF GRAPHENE ON COBALT-CAPPED COPPER DUAL DAMASCENE INTERCONNECT (INTERNATIONAL BUSINESS MACHINES CORPORATION)
- 18333606. NICKEL-IRON-OXIDE THIN FILMS AS AN ELECTROCATALYST FOR WATER OXIDATION (KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS)
- 18347683. DIELECTRIC DENSIFICATION simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18398146. ETCHING METHOD AND PLASMA PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18398796. METHODS FOR FORMING GAP-FILLING MATERIALS AND RELATED APPARATUS AND STRUCTURES simplified abstract (ASM IP Holding B.V.)
- 18428866. SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18434982. CYCLICAL DEPOSITION METHODS AND STRUCTURES FORMED USING THE METHODS simplified abstract (ASM IP Holding B.V.)
- 18455508. SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL (Applied Materials, Inc.)
- 18455941. THIN FILM STRUCTURE INCLUDING DIELECTRIC MATERIAL LAYER, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC DEVICE EMPLOYING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18512923. METHOD AND SYSTEM FOR PROCESSING SUBSTRATES simplified abstract (Samsung Electronics Co., Ltd.)
- 18522056. SCANDIUM PRECURSOR FOR SC2O3 OR SC2S3 ATOMIC LAYER DEPOSITION simplified abstract (Intel Corporation)
- 18524767. FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING simplified abstract (TOKYO ELECTRON LIMITED)
- 18526472. SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18538267. INNER SPACER LINER FOR GATE-ALL-AROUND DEVICE simplified abstract (Applied Materials, Inc.)
- 18543996. TREATMENTS TO ENHANCE MATERIAL STRUCTURES simplified abstract (Applied Materials, Inc.)
- 18544315. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD simplified abstract (Samsung Display Co., LTD.)
- 18552957. FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18587841. POWDER METALLURGICAL APPROACH TO A CoFe - AL2O3 SOFT MAGNETIC COMPOSITE (The Regents of the University of California)
- 18595374. SEGMENTED FORMATION OF GATE INTERFACE simplified abstract (Applied Materials, Inc.)
- 18604349. INSULATING DEVICE AND METHOD FOR MANUFACTURING INSULATING DEVICE (Kabushiki Kaisha Toshiba)
- 18604349. INSULATING DEVICE AND METHOD FOR MANUFACTURING INSULATING DEVICE (TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION)
- 18609433. IMMERSION EXPOSURE TOOL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18611093. METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18612197. Additive Manufacturing Powder, Method For Producing Additive Manufacturing Powder, And Additively Manufactured Body simplified abstract (SEIKO EPSON CORPORATION)
- 18613671. METHOD FOR COATING PHARMACEUTICAL SUBSTRATES simplified abstract (Applied Materials, Inc.)
- 18638530. FLEXIBLE DISPLAY AND METHOD OF MANUFACTURING THE SAME simplified abstract (Samsung Display Co., LTD.)
- 18639575. METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18645060. GAS BARRIER LAMINATE, PACKAGING BODY AND PACKAGED ARTICLE simplified abstract (TOPPAN Holdings Inc.)
- 18649004. METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES simplified abstract (AGILENT TECHNOLOGIES, INC.)
- 18649035. METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES simplified abstract (AGILENT TECHNOLOGIES, INC.)
- 18649171. METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES simplified abstract (AGILENT TECHNOLOGIES, INC.)
- 18649199. METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES simplified abstract (AGILENT TECHNOLOGIES, INC.)
- 18649231. METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES simplified abstract (AGILENT TECHNOLOGIES, INC.)
- 18649268. METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES simplified abstract (AGILENT TECHNOLOGIES, INC.)
- 18649302. METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES simplified abstract (AGILENT TECHNOLOGIES, INC.)
- 18668645. ANTENNA AND PLASMA PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18693977. LAMINATED STRUCTURE, SEMICONDUCTOR DEVICE, AND METHOD OF FORMING CRYSTALLINE OXIDE FILM simplified abstract (Shin-Etsu Chemical Co., Ltd.)
- 18705428. ATOMIC LAYER DEPOSITION SEAM REDUCTION (Lam Research Corporation)
- 18740699. METHOD, SYSTEM, AND APPARATUS FOR DEPOSITION OF TRANSITION METAL FILM (ASM IP Holding B.V.)
- 18946807. MULTILAYER COATING FOR CORROSION RESISTANCE (Applied Materials, Inc.)
- 18957283. TIN OXIDE MANDRELS IN PATTERNING (Lam Research Corporation)
- 18967466. SELECTIVE DEPOSITION OF MATERIAL COMPRISING SILICON AND OXYGEN USING PLASMA (ASM IP Holding B.V.)
- 18970324. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited)
3
A
- Applied materials, inc. (20240247370). ATOMIC LAYER DEPOSITION OF RUTHENIUM OXIDE COATINGS simplified abstract
- Applied materials, inc. (20240282632). ELECTRONIC DEVICE FABRICATION USING AREA-SELECTIVE DEPOSITION simplified abstract
- Applied materials, inc. (20240301552). ULTRA HIGH-K HAFNIUM OXIDE AND HAFNIUM ZIRCONIUM OXIDE FILMS simplified abstract
- Applied materials, inc. (20240304423). SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES simplified abstract
- Applied materials, inc. (20240339318). SEGMENTED FORMATION OF GATE INTERFACE simplified abstract
- Applied materials, inc. (20250003061). INTERFACE TUNING FOR EROSION AND CORROSION RESISTANT COATINGS FOR SEMICONDUCTOR COMPONENTS
- Applied materials, inc. (20250006474). INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS
- Applied materials, inc. (20250066913). SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL
- Applied materials, inc. (20250069857). MULTILAYER COATING FOR CORROSION RESISTANCE
- Applied Materials, Inc. patent applications on August 22nd, 2024
- Applied Materials, Inc. patent applications on February 13th, 2025
- Applied Materials, Inc. patent applications on February 20th, 2025
- Applied Materials, Inc. patent applications on February 27th, 2025
- Applied Materials, Inc. patent applications on January 2nd, 2025
- Applied Materials, Inc. patent applications on July 25th, 2024
- Applied Materials, Inc. patent applications on October 10th, 2024
- Applied Materials, Inc. patent applications on September 12th, 2024
B
C
G
I
- Intel corporation (20240272547). TIN CARBOXYLATE PRECURSORS FOR METAL OXIDE RESIST LAYERS AND RELATED METHODS simplified abstract
- Intel corporation (20240332071). PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF DIELECTRIC MATERIAL UPON OXIDIZABLE MATERIAL simplified abstract
- Intel Corporation patent applications on August 15th, 2024
- Intel Corporation patent applications on October 3rd, 2024
K
S
- Samsung display co., ltd. (20240240320). PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD simplified abstract
- Samsung display co., ltd. (20240266440). FLEXIBLE DISPLAY AND METHOD OF MANUFACTURING THE SAME simplified abstract
- Samsung Display Co., LTD. patent applications on August 8th, 2024
- Samsung Display Co., LTD. patent applications on July 18th, 2024
- Samsung electronics co., ltd. (20240213017). METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE simplified abstract
- Samsung electronics co., ltd. (20240282573). METHOD AND SYSTEM FOR PROCESSING SUBSTRATES simplified abstract
- Samsung electronics co., ltd. (20240429043). METHOD OF FORMING INSULATING FILM BY USING ATOMIC LAYER DEPOSITION
- Samsung Electronics Co., Ltd. patent applications on August 22nd, 2024
- Samsung Electronics Co., Ltd. patent applications on December 26th, 2024
- Samsung Electronics Co., Ltd. patent applications on June 27th, 2024
- SEIKO EPSON CORPORATION (20240316630). Additive Manufacturing Powder, Method For Producing Additive Manufacturing Powder, And Additively Manufactured Body simplified abstract
- Seiko epson corporation (20240316630). Additive Manufacturing Powder, Method For Producing Additive Manufacturing Powder, And Additively Manufactured Body simplified abstract
- SEIKO EPSON CORPORATION patent applications on September 26th, 2024
T
- Taiwan semiconductor manufacturing company, ltd. (20240102162). MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240231240). IMMERSION EXPOSURE TOOL simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240266166). DIELECTRIC DENSIFICATION simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240282571). METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 22nd, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 8th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on February 8th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on July 11th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on March 14th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on March 28th, 2024
- Tokyo electron limited (20240295022). PROCESSING METHOD AND PROCESSING APPARATUS simplified abstract
- Tokyo electron limited (20240297209). FILM FORMING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND PROCESSING SYSTEM simplified abstract
- Tokyo Electron Limited patent applications on September 5th, 2024
