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Category:C07F7/22
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This category has the following 11 subcategories, out of 11 total.
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Pages in category "C07F7/22"
The following 30 pages are in this category, out of 30 total.
1
- 18212913. PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18326632. RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18329976. ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18420038. ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION (SAMSUNG ELECTRONICS CO., LTD.)
- 18484247. SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (SAMSUNG SDI CO., LTD.)
- 18503696. PHOTOACID GENERATOR simplified abstract (International Business Machines Corporation)
- 18777777. PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING A PHOTORESIST COMPOSITION (SAMSUNG ELECTRONICS CO., LTD.)
- 18793603. SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION (SAMSUNG SDI CO., LTD.)
- 18817771. Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process (Shin-Etsu Chemical Co., Ltd.)
S
- Samsung electronics co., ltd. (20240231222). PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240231223). RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240239820). ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMING METHOD USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240255845). PHOTORESIST COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240255848). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20250093772). PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING A PHOTORESIST COMPOSITION
- Samsung electronics co., ltd. (20250102906). ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION
- Samsung Electronics Co., Ltd. patent applications on August 1st, 2024
- Samsung Electronics Co., Ltd. patent applications on July 11th, 2024
- Samsung Electronics Co., Ltd. patent applications on July 18th, 2024
- Samsung Electronics Co., Ltd. patent applications on March 20th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 20th, 2025
- Samsung Electronics Co., Ltd. patent applications on March 27th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 27th, 2025
- Samsung sdi co., ltd. (20240241437). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung sdi co., ltd. (20240345478). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung sdi co., ltd. (20250068066). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
- SAMSUNG SDI CO., LTD. patent applications on February 27th, 2025
- SAMSUNG SDI CO., LTD. patent applications on July 18th, 2024
- Samsung SDI Co., Ltd. patent applications on October 17th, 2024