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Category:C07D333/54
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Pages in category "C07D333/54"
The following 5 pages are in this category, out of 5 total.
1
- 18376925. ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18576707. NOVEL COMPOUND AND ORGANIC LIGHT EMITTING DEVICE COMPRISING THE SAME simplified abstract (LG Chem, Ltd.)
- 18746861. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUNDS simplified abstract (FUJIFILM Corporation)
F
- Fujifilm corporation (20240337931). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUNDS simplified abstract
- FUJIFILM Corporation patent applications on October 10th, 2024
