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Category:C07C323/09
Subcategories
This category has the following 2 subcategories, out of 2 total.
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Pages in category "C07C323/09"
The following 10 pages are in this category, out of 10 total.
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- 18169524. COMPOUND FOR ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTRONIC ELEMENT USING THE SAME, AND AN ELECTRONIC DEVICE THEREOF simplified abstract (SAMSUNG DISPLAY CO., LTD.)
- 18312825. CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18746861. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUNDS simplified abstract (FUJIFILM Corporation)
- 18903533. ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
- 18909136. ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS (Shin-Etsu Chemical Co., Ltd.)
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- Fujifilm corporation (20240337931). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUNDS simplified abstract
- FUJIFILM Corporation patent applications on October 10th, 2024
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- Samsung electronics co., ltd. (20240199540). CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION simplified abstract
- Samsung Electronics Co., Ltd. patent applications on June 20th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on June 20th, 2024