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Category:Applied Materials, Inc.
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Pages in category "Applied Materials, Inc."
The following 200 pages are in this category, out of 569 total.
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- 17748270. METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE simplified abstract (Applied Materials, Inc.)
- 17835107. MOLTEN LIQUID TRANSPORT FOR TUNABLE VAPORIZATION IN ION SOURCES simplified abstract (Applied Materials, Inc.)
- 17835711. AUTO FINE-TUNER FOR DESIRED TEMPERATURE PROFILE simplified abstract (Applied Materials, Inc.)
- 17835864. PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS simplified abstract (Applied Materials, Inc.)
- 17836657. PLASMA PRECLEAN SYSTEM FOR CLUSTER TOOL simplified abstract (Applied Materials, Inc.)
- 17837543. PATTERNING LAYER MODIFICATION USING DIRECTIONAL RADICAL RIBBON BEAM simplified abstract (Applied Materials, Inc.)
- 17837958. METHOD AND APPARATUS FOR ETCHING A SEMICONDUCTOR SUBSTRATE IN A PLASMA ETCH CHAMBER simplified abstract (Applied Materials, Inc.)
- 17839235. TAB ARRANGEMENT FOR RETAINING SUPPORT ELEMENTS OF SUBSTRATE SUPPORT simplified abstract (Applied Materials, Inc.)
- 17839809. METHOD OF FORMING CARBON-BASED SPACER FOR EUV PHOTORESIST PATTERNS simplified abstract (Applied Materials, Inc.)
- 17869987. APPARATUS FOR GENERATING ETCHANTS FOR REMOTE PLASMA PROCESSES simplified abstract (Applied Materials, Inc.)
- 17936608. SURFACE ROUGHNESS AND EMISSIVITY DETERMINATION simplified abstract (Applied Materials, Inc.)
- 17945910. ON-BOARD CLEANING OF TOOLING PARTS IN HYBRID BONDING TOOL simplified abstract (Applied Materials, Inc.)
- 17946842. ATOMIC LAYER DEPOSITION PART COATING CHAMBER simplified abstract (Applied Materials, Inc.)
- 17946947. BACKSIDE DEPOSITION FOR WAFER BOW MANAGEMENT simplified abstract (Applied Materials, Inc.)
- 17947675. WIDEBAND VARIABLE IMPEDANCE LOAD FOR HIGH VOLUME MANUFACTURING QUALIFICATION AND ON-SITE DIAGNOSTICS simplified abstract (Applied Materials, Inc.)
- 17949083. IN-SITU CARBON LINER FOR HIGH ASPECT RATIO FEATURES simplified abstract (Applied Materials, Inc.)
- 17949091. FLUID VAPOR MIXING AND DELIVERY SYSTEM simplified abstract (Applied Materials, Inc.)
- 17949862. DRIFT TUBE ELECTRODE ARRANGEMENT HAVING DIRECT CURRENT OPTICS simplified abstract (Applied Materials, Inc.)
- 17949937. EDGE DEFECT DETECTION VIA IMAGE ANALYTICS simplified abstract (Applied Materials, Inc.)
- 17950012. GROUNDING DEVICES FOR SUBSTRATE PROCESSING CHAMBERS simplified abstract (Applied Materials, Inc.)
- 17950046. Glassy Carbon Shutter Disk For Physical Vapor Deposition (PVD) Chamber simplified abstract (Applied Materials, Inc.)
- 17955785. DOG BONE EXHAUST SLIT TUNNEL FOR PROCESSING CHAMBERS simplified abstract (Applied Materials, Inc.)
- 17956157. SELECTIVE OXIDATION OF A SUBSTRATE simplified abstract (Applied Materials, Inc.)
- 17956192. PARTICLE ACCELERATOR HAVING NOVEL ELECTRODE CONFIGURATION FOR QUADRUPOLE FOCUSING simplified abstract (Applied Materials, Inc.)
- 17957095. HELICAL VOLTAGE STANDOFF simplified abstract (Applied Materials, Inc.)
- 17959076. MEMBRANE FAILURE DETECTION SYSTEM simplified abstract (Applied Materials, Inc.)
- 17959189. CASSETTE STRUCTURES AND RELATED METHODS FOR BATCH PROCESSING IN EPITAXIAL DEPOSITION OPERATIONS simplified abstract (Applied Materials, Inc.)
- 17959967. METHODS FOR FABRICATION OF OPTICAL STRUCTURES ON PHOTONIC GLASS LAYER SUBSTRATES simplified abstract (Applied Materials, Inc.)
- 17959973. PHOTONIC GLASS LAYER SUBSTRATE WITH EMBEDDED OPTICAL STRUCTURES FOR COMMUNICATING WITH AN ELECTRO OPTICAL INTEGRATED CIRCUIT simplified abstract (Applied Materials, Inc.)
- 17960569. CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIAL simplified abstract (Applied Materials, Inc.)
- 17960666. IN-SITU ELECTRIC FIELD DETECTION METHOD AND APPARATUS simplified abstract (Applied Materials, Inc.)
- 17960979. DIELECTRIC ON DIELECTRIC SELECTIVE DEPOSITION USING ANILINE PASSIVATION simplified abstract (Applied Materials, Inc.)
- 17961214. LOAD LOCK CHAMBERS AND RELATED METHODS AND STRUCTURES FOR BATCH COOLING OR HEATING simplified abstract (Applied Materials, Inc.)
- 17961553. HALOGEN-RESISTANT THERMAL BARRIER COATING FOR PROCESSING CHAMBERS simplified abstract (Applied Materials, Inc.)
- 17962310. HALOGEN-RESISTANT THERMAL BARRIER COATING FOR PROCESSING CHAMBERS simplified abstract (Applied Materials, Inc.)
- 17962378. ATOMIC LAYER DEPOSITION COATING SYSTEM FOR INNER WALLS OF GAS LINES simplified abstract (Applied Materials, Inc.)
- 17962410. BIPOLAR ELECTROSTATIC CHUCK FOR ETCH CHAMBER simplified abstract (Applied Materials, Inc.)
- 17963555. BOTTOM CONTACT FORMATION FOR 4F2 VERTICAL DRAM simplified abstract (Applied Materials, Inc.)
- 17963687. ISOTROPIC SILICON NITRIDE REMOVAL simplified abstract (Applied Materials, Inc.)
- 17969333. SELECTIVE TRENCH MODIFICATION USING DIRECTIONAL ETCH simplified abstract (Applied Materials, Inc.)
- 17969368. MODIFYING PATTERNED FEATURES USING A DIRECTIONAL ETCH simplified abstract (Applied Materials, Inc.)
- 17970434. GAS DELIVERY PALLET ASSEMBLY, CLEANING UNIT AND CHEMICAL MECHANICAL POLISHING SYSTEM HAVING THE SAME simplified abstract (Applied Materials, Inc.)
- 17970872. Ru Liner above a Barrier Layer simplified abstract (Applied Materials, Inc.)
- 17971205. IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOSITION THEREON IN A LARGE PECVD CHAMBER simplified abstract (Applied Materials, Inc.)
- 17971338. HEAT SOURCE ARRANGEMENTS, PROCESSING CHAMBERS, AND RELATED METHODS TO FACILITATE DEPOSITION PROCESS ADJUSTABILITY simplified abstract (Applied Materials, Inc.)
- 17971494. PROCESS CHAMBER WITH REFLECTOR simplified abstract (Applied Materials, Inc.)
- 17984772. REDUCING ASPECT RATIO DEPENDENT ETCH WITH DIRECT CURRENT BIAS PULSING simplified abstract (Applied Materials, Inc.)
- 17985393. MONOLITHIC SUBSTRATE SUPPORT HAVING POROUS FEATURES AND METHODS OF FORMING THE SAME simplified abstract (Applied Materials, Inc.)
- 17987591. ULTRAVIOLET AND OZONE CLEANING APPARATUS AND METHOD OF USING simplified abstract (Applied Materials, Inc.)
- 17987679. ADDITION OF EXTERNAL ULTRAVIOLET LIGHT FOR IMPROVED PLASMA STRIKE CONSISTENCY simplified abstract (Applied Materials, Inc.)
- 17988083. METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE simplified abstract (Applied Materials, Inc.)
- 17991931. AREA SELECTIVE DEPOSITION THROUGH SURFACE SILYLATION simplified abstract (Applied Materials, Inc.)
- 18048748. GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY simplified abstract (Applied Materials, Inc.)
- 18059222. SOLID-STATE SWITCH BASED HIGH-SPEED PULSER WITH PLASMA IEDF MODIFICATION CAPABILITY THROUGH MULTILEVEL OUTPUT FUNCTIONALITY simplified abstract (Applied Materials, Inc.)
- 18059658. SYSTEM AND METHODS FOR IMPLEMENTING A MICRO PULSING SCHEME USING DUAL INDEPENDENT PULSERS simplified abstract (Applied Materials, Inc.)
- 18061733. DRAM TRANSISTOR INCLUDING HORIZONAL BODY CONTACT simplified abstract (Applied Materials, Inc.)
- 18063888. CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER simplified abstract (Applied Materials, Inc.)
- 18070010. GAS RECYCLING SYSTEMS, SUBSTRATE PROCESSING SYSTEMS, AND RELATED APPARATUS AND METHODS FOR SEMICONDUCTOR MANUFACTURING simplified abstract (Applied Materials, Inc.)
- 18070448. DETERMINING EQUIPMENT CONSTANT UPDATES BY MACHINE LEARNING simplified abstract (Applied Materials, Inc.)
- 18070453. ADJUSTING CHAMBER PERFORMANCE BY EQUIPMENT CONSTANT UPDATES simplified abstract (Applied Materials, Inc.)
- 18070456. CHAMBER MATCHING BY EQUIPMENT CONSTANT UPDATES simplified abstract (Applied Materials, Inc.)
- 18070640. Lattice Based Voltage Standoff simplified abstract (Applied Materials, Inc.)
- 18070744. MODELING FOR INDEXING AND SEMICONDUCTOR DEFECT IMAGE RETRIEVAL simplified abstract (Applied Materials, Inc.)
- 18071391. MATERIALS ENGINEERING FOR ANTI-COKING COATING STACKS simplified abstract (Applied Materials, Inc.)
- 18072171. SUBSTRATE DEFECT ANALYSIS simplified abstract (Applied Materials, Inc.)
- 18073229. PASSIVE SEPARATION CASSETTE AND CARRIER simplified abstract (Applied Materials, Inc.)
- 18074197. MULTI-PULSE DEPOSITION PROCESSES simplified abstract (Applied Materials, Inc.)
- 18074335. Method to Deposit Metal Cap for Interconnect simplified abstract (Applied Materials, Inc.)
- 18074385. Heated Pedestal With Impedance Matching Radio Frequency (RF) Rod simplified abstract (Applied Materials, Inc.)
- 18075055. METHODS AND MECHANISMS FOR AUTOMATIC SENSOR GROUPING TO IMPROVE ANOMALY DETECTION simplified abstract (Applied Materials, Inc.)
- 18075216. SEMICONDUCTOR FILM THICKNESS PREDICTION USING MACHINE-LEARNING simplified abstract (Applied Materials, Inc.)
- 18076234. THERMAL CHOKE PLATE simplified abstract (Applied Materials, Inc.)
- 18076725. LEARNING BASED TUNING IN A RADIO FREQUENCY PLASMA PROCESSING CHAMBER simplified abstract (Applied Materials, Inc.)
- 18077225. ELECTROCHEMICAL REDUCTION OF SURFACE METAL OXIDES simplified abstract (Applied Materials, Inc.)
- 18077809. TWO STEP IMPLANT TO IMPROVE LINE EDGE ROUGHNESS AND LINE WIDTH ROUGHNESS simplified abstract (Applied Materials, Inc.)
- 18077812. TWO STEP IMPLANT TO CONTROL TIP-TO-TIP DISTANCE BETWEEN TRENCHES simplified abstract (Applied Materials, Inc.)
- 18078416. Integrated process sequence for hybrid bonding applications simplified abstract (Applied Materials, Inc.)
- 18078841. Method of Selective Metal Deposition Using Separated Reactant Activation and Plasma Discharging Zone simplified abstract (Applied Materials, Inc.)
- 18079755. CARRIER WITH ROTATION PREVENTION FEATURE simplified abstract (Applied Materials, Inc.)
- 18079817. Selective Implantation into STI of ETSOI Device simplified abstract (Applied Materials, Inc.)
- 18080555. ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION simplified abstract (Applied Materials, Inc.)
- 18083075. Method for Gapfill simplified abstract (Applied Materials, Inc.)
- 18086150. Silicon (Si) Dry Etch for Die-to-Wafer Thinning simplified abstract (Applied Materials, Inc.)
- 18087255. SUBSTRATE SUPPORTS AND TRANSFER APPARATUS FOR SUBSTRATE DEFORMATION simplified abstract (Applied Materials, Inc.)
- 18087434. AMPOULE FOR A SEMICONDUCTOR MANUFACTURING PRECURSOR simplified abstract (Applied Materials, Inc.)
- 18087641. MACHINE AND DEEP LEARNING TECHNIQUES FOR PREDICTING ECOLOGICAL EFFICIENCY IN SUBSTRATE PROCESSING simplified abstract (Applied Materials, Inc.)
- 18089216. Power Compensation in PVD Chambers simplified abstract (Applied Materials, Inc.)
- 18089632. EFFICIENT AUTOCATALYTIC METALLIZATION OF POLYMERIC SURFACES simplified abstract (Applied Materials, Inc.)
- 18091041. XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER simplified abstract (Applied Materials, Inc.)
- 18091552. Methods and Apparatus for Processing a Substrate simplified abstract (Applied Materials, Inc.)
- 18093138. Programmable Electrostatic Chuck to Enhance Aluminum Film Morphology simplified abstract (Applied Materials, Inc.)
- 18093139. Method and Apparatus for Substrate Temperature Control simplified abstract (Applied Materials, Inc.)
- 18093141. Programmable ESC to Enhance Aluminum Film Morphology simplified abstract (Applied Materials, Inc.)
- 18093156. PLASMA-ENHANCED MOLYBDENUM DEPOSITION simplified abstract (Applied Materials, Inc.)
- 18093615. COOLING FLOW IN SUBSTRATE PROCESSING ACCORDING TO PREDICTED COOLING PARAMETERS simplified abstract (Applied Materials, Inc.)
- 18093681. CLEANING OPERATIONS BASED ON DEPOSITION THICKNESS simplified abstract (Applied Materials, Inc.)
- 18094765. CHAMBERS, METHODS, AND APPARATUS FOR GENERATING ATOMIC RADICALS USING UV LIGHT simplified abstract (Applied Materials, Inc.)
- 18095262. MODULAR PRECURSOR DELIVERY AND SPLITTING FOR FAST SWITCHING simplified abstract (Applied Materials, Inc.)
- 18095279. DIRECTIONAL SELECTIVE FILL FOR SILICON GAP FILL PROCESSES simplified abstract (Applied Materials, Inc.)
- 18098791. DRY ETCH OF BORON-CONTAINING MATERIAL simplified abstract (Applied Materials, Inc.)
- 18098993. MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITION simplified abstract (Applied Materials, Inc.)
- 18099039. REMOVABLE MASK LAYER TO REDUCE OVERHANG DURING RE-SPUTTER PROCESS IN PVD CHAMBERS simplified abstract (Applied Materials, Inc.)
- 18099210. SUBSTRATE SUPPORT CARRIER HAVING MULTIPLE CERAMIC DISCS simplified abstract (Applied Materials, Inc.)
- 18099353. Ion Source For Controlling Decomposition Buildup Using Chlorine Co-Gas simplified abstract (Applied Materials, Inc.)
- 18099459. ATOMIC LAYER DEPOSITION OF RUTHENIUM OXIDE COATINGS simplified abstract (Applied Materials, Inc.)
- 18099846. FORMATION OF METALLIC FILMS ON ELECTROLESS METAL PLATING OF SURFACES simplified abstract (Applied Materials, Inc.)
- 18100289. DRAM Transistor Including Pillars Formed Using Low-Temperature Ion Implant simplified abstract (Applied Materials, Inc.)
- 18100326. ADJUSTABLE CROSS-FLOW PROCESS CHAMBER LID simplified abstract (Applied Materials, Inc.)
- 18100568. METHOD OF FORMING AN AQUEOUS POLYMER COMPOSITION simplified abstract (Applied Materials, Inc.)
- 18100978. METHOD FOR CONTROLLING LAYER-TO-LAYER THICKNESS IN MULTI-TIER EPITAXIAL PROCESS simplified abstract (Applied Materials, Inc.)
- 18101260. Dose Cup Assembly for an Ion Implanter simplified abstract (Applied Materials, Inc.)
- 18101523. PRE-HEAT RINGS AND PROCESSING CHAMBERS INCLUDING BLACK QUARTZ, AND RELATED METHODS simplified abstract (Applied Materials, Inc.)
- 18101555. INTEGRATED CLEAN AND DRY MODULE FOR CLEANING A SUBSTRATE simplified abstract (Applied Materials, Inc.)
- 18108327. MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS simplified abstract (Applied Materials, Inc.)
- 18108719. DIPOLE FORMATION PROCESSES simplified abstract (Applied Materials, Inc.)
- 18109365. ELECTRONIC DEVICE FABRICATION USING AREA-SELECTIVE DEPOSITION simplified abstract (Applied Materials, Inc.)
- 18110668. PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY simplified abstract (Applied Materials, Inc.)
- 18112252. TREATMENTS TO IMPROVE ETCHED SILICON-AND-GERMANIUM-CONTAINING MATERIAL SURFACE ROUGHNESS simplified abstract (Applied Materials, Inc.)
- 18112564. Layered Substrate with Ruthenium Layer and Method for Producing simplified abstract (Applied Materials, Inc.)
- 18118017. HYDROGEN PLASMA TREATMENT FOR FORMING LOGIC DEVICES simplified abstract (Applied Materials, Inc.)
- 18118499. PRECURSOR DELIVERY SYSTEM FOR SEMICONDUCTOR DEVICE FORMATION simplified abstract (Applied Materials, Inc.)
- 18118543. Novel arc management algorithm of RF generator and match box for CCP plasma chambers simplified abstract (Applied Materials, Inc.)
- 18119432. ULTRA HIGH-K HAFNIUM OXIDE AND HAFNIUM ZIRCONIUM OXIDE FILMS simplified abstract (Applied Materials, Inc.)
- 18122530. PROCESSING SYSTEMS, CHAMBERS, AND RELATED METHODS INCLUDING THERMOELECTRIC GENERATORS FOR ENERGY HARNESSING simplified abstract (Applied Materials, Inc.)
- 18122537. PROCESSING SYSTEMS, CHAMBERS, AND RELATED METHODS INCLUDING TURBINES FOR ENERGY HARNESSING simplified abstract (Applied Materials, Inc.)
- 18122574. APPARATUS AND METHODS FOR CONTROLLING SUBSTRATE TEMPERATURE DURING PROCESSING simplified abstract (Applied Materials, Inc.)
- 18123090. RADIATION SEPARATION SYSTEM simplified abstract (Applied Materials, Inc.)
- 18123101. ULTRA-THIN LAYERS BY SELECTIVE PASSIVATION simplified abstract (Applied Materials, Inc.)
- 18123746. COMPRESSION GAP CONTROL FOR PAD-BASED CHEMICAL BUFF POST CMP CLEANING simplified abstract (Applied Materials, Inc.)
- 18124401. INDIRECT PLASMA HEALTH MONITORING simplified abstract (Applied Materials, Inc.)
- 18131212. HIGH TEMPERATURE METAL SEALS FOR VACUUM SEGREGATION simplified abstract (Applied Materials, Inc.)
- 18131271. APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM simplified abstract (Applied Materials, Inc.)
- 18131287. HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM simplified abstract (Applied Materials, Inc.)
- 18131321. Atmospheric Pressure Plasma for Substrate Annealing simplified abstract (Applied Materials, Inc.)
- 18131534. ADVANCED METHOD FOR CREATING ELECTROSTATIC CHUCK (ESC) MESA PATTERNS simplified abstract (Applied Materials, Inc.)
- 18131939. SUSCEPTOR FOR PROCESS CHAMBER simplified abstract (Applied Materials, Inc.)
- 18131956. METHOD OF FORMING A METAL LINER FOR INTERCONNECT STRUCTURES simplified abstract (Applied Materials, Inc.)
- 18132861. SYSTEMS, APPARATUS, AND METHODS FOR MONITORING PLATE TEMPERATURE FOR SEMICONDUCTOR MANUFACTURING simplified abstract (Applied Materials, Inc.)
- 18149829. SELECTIVE METAL SELECTIVITY IMPROVEMENT WITH RF PULSING simplified abstract (Applied Materials, Inc.)
- 18158370. PROCESS CHAMBER QUALIFICATION FOR MAINTENANCE PROCESS ENDPOINT DETECTION simplified abstract (Applied Materials, Inc.)
- 18158379. BIPOLAR ELECTROSTATIC CHUCK ELECTRODE DESIGNS simplified abstract (Applied Materials, Inc.)
- 18158916. METHODS FOR REDUCING MICRO AND MACRO SCALLOPING ON SEMICONDUCTOR DEVICES simplified abstract (Applied Materials, Inc.)
- 18159208. APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS simplified abstract (Applied Materials, Inc.)
- 18159214. APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS simplified abstract (Applied Materials, Inc.)
- 18159222. APPARATUS AND METHODS FOR HEATING TUNABILITY IN PROCESSING CHAMBERS simplified abstract (Applied Materials, Inc.)
- 18170335. PHYSICAL LAYOUT SYNTHESIS FOR STANDARD CELLS USING SLICE LAYOUTS simplified abstract (Applied Materials, Inc.)
- 18171090. SILICON SUPER JUNCTION STRUCTURES FOR INCREASED VOLTAGE simplified abstract (Applied Materials, Inc.)
- 18171119. SILICON SUPER JUNCTION STRUCTURES FOR INCREASED THROUGHPUT simplified abstract (Applied Materials, Inc.)
- 18171598. SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROVEMENT simplified abstract (Applied Materials, Inc.)
- 18172149. LOUVER DESIGN FOR ELIMINATING LINE OF SIGHT simplified abstract (Applied Materials, Inc.)
- 18181077. SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES simplified abstract (Applied Materials, Inc.)
- 18181491. FABRICATION TOOL CALIBRATION simplified abstract (Applied Materials, Inc.)
- 18183000. METHODS FOR UPPER PLATEN MANUFACTURING simplified abstract (Applied Materials, Inc.)
- 18185242. SEMICONDUCTOR DEVICES CONTAINING BI-METALLIC SILICIDE WITH REDUCED CONTACT RESISTIVITY simplified abstract (Applied Materials, Inc.)
- 18185849. METHOD FOR DETECTION OF WAFER SLIPPAGE simplified abstract (Applied Materials, Inc.)
- 18185900. FACEPLATE LOADING PLATFORM simplified abstract (Applied Materials, Inc.)
- 18186091. MEMORY STRUCTURE WITH 4F2 OPTIMIZED CELL LAYOUT simplified abstract (Applied Materials, Inc.)
- 18186656. METHOD TO IMPROVE INTERCONNECT COEFFICIENT OF THERMAL EXPANSION simplified abstract (Applied Materials, Inc.)
- 18195052. METAL ORGANONITRILE PRECURSORS FOR THIN FILM DEPOSITION simplified abstract (Applied Materials, Inc.)
- 18197846. Interlayer for Resistivity Reduction in Metal Deposition Applications simplified abstract (Applied Materials, Inc.)
- 18198064. METHODS FOR PATTERNING SUBSTRATES TO ADJUST VOLTAGE PROPERTIES simplified abstract (Applied Materials, Inc.)
- 18204774. UV CURABLE PRINTABLE FORMULATIONS FOR HIGH PERFORMANCE 3D PRINTED CMP PADS simplified abstract (Applied Materials, Inc.)
- 18206443. DIFFERENTIAL SUBSTRATE BACKSIDE COOLING simplified abstract (Applied Materials, Inc.)
- 18206456. ELECTRICAL BREAK FOR SUBSTRATE PROCESSING SYSTEMS simplified abstract (Applied Materials, Inc.)
- 18206847. CCP GAS DELIVERY NOZZLE simplified abstract (Applied Materials, Inc.)
- 18206861. REGENERATOR FOR FORELINE HEATING simplified abstract (Applied Materials, Inc.)
- 18209035. SELECTIVE SELF-ASSEMBLED MONOLAYER (SAM) REMOVAL (Applied Materials, Inc.)
- 18209348. IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES (Applied Materials, Inc.)
- 18209649. SUBSTRATE SUPPORT (Applied Materials, Inc.)
- 18209700. NESTED-LOOP PLASMA ENHANCED ATOMIC LAYER DEPOSITION (Applied Materials, Inc.)
- 18209711. IN-SITU ETCH AND INHIBITION IN PLASMA ENHANCED ATOMIC LAYER DEPOSITION (Applied Materials, Inc.)
- 18209716. SEMICONDUCTOR MANUFACTURING PROCESS CHAMBER COOLING FLANGE FOR REMOTE PLASMA SOURCE SUPPLY (Applied Materials, Inc.)
- 18209719. SYSTEMS AND METHODS FOR IMPROVING MECHANICAL STRENGTH OF LOW DIELECTRIC CONSTANT MATERIALS (Applied Materials, Inc.)
- 18209732. DENSIFIED SEAM-FREE SILICON-CONTAINING MATERIAL GAP FILL PROCESSES (Applied Materials, Inc.)
- 18209821. METHODS AND MECHANISMS FOR SECURE DATA SHARING (Applied Materials, Inc.)
- 18210328. ELECTROSTATIC SUBSTRATE SUPPORT (Applied Materials, Inc.)
- 18210522. DOPED SILICON OXIDE FOR BOTTOM-UP DEPOSITION (Applied Materials, Inc.)
- 18210524. METHOD OF ASSEMBLING DRIFT TUBE ASSEMBLIES IN ION IMPLANTORS (Applied Materials, Inc.)
- 18210651. METAL OXIDE PRECLEAN FOR BOTTOM-UP GAPFILL IN MEOL AND BEOL (Applied Materials, Inc.)
- 18210884. INTEGRATED GAS BOX AND ION SOURCE (Applied Materials, Inc.)
- 18210918. METHODS OF SELECTIVELY ETCHING SILICON NITRIDE (Applied Materials, Inc.)
- 18211044. COPPER REFLOW BY SURFACE MODIFICATION (Applied Materials, Inc.)
- 18211502. SELECTIVE LINER DEPOSITION FOR VIA RESISTANCE REDUCTION (Applied Materials, Inc.)
- 18218579. WAFER EDGE PROFILE CONTROL USING CONNECTED EDGE RING HARDWARE (Applied Materials, Inc.)
- 18218794. Finger Electrostatic Chuck for High Resistance Substrate Chucking (Applied Materials, Inc.)
- 18218825. Shield Ring Mounting Using Compliant Hardware (Applied Materials, Inc.)
- 18218979. VACUUM ENABLED GRIPPER WITH ROLLER CONTACT FINGERS (Applied Materials, Inc.)
- 18220020. WIRELESS DATA COMMUNICATION IN PLASMA PROCESS CHAMBER THROUGH VI SENSOR AND RF GENERATOR simplified abstract (Applied Materials, Inc.)
- 18222897. INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTORESIST simplified abstract (Applied Materials, Inc.)
- 18222979. Lamp Housing Braze Improvement for Semiconductor Rapid Thermal Processing (RTP) Chamber simplified abstract (Applied Materials, Inc.)
- 18236042. METHODS OF ETCHING SILICON-AND-OXYGEN-CONTAINING FEATURES AT LOW TEMPERATURES (Applied Materials, Inc.)
- 18236115. SUSCEPTOR HEIGHT ADJUSTMENT (Applied Materials, Inc.)
- 18236201. SUSCEPTOR HEAT TRANSFER (Applied Materials, Inc.)
- 18236554. INTEGRATED SUBSTRATE PROCESSING SYSTEM WITH ADVANCED SUBSTRATE HANDLING ROBOT (Applied Materials, Inc.)
- 18236711. IN-SITU ION BEAM ANGLE MEASUREMENT (Applied Materials, Inc.)
- 18236922. SINGLE GATE THREE-DIMENSIONAL (3D) DYNAMIC RANDOM-ACCESS MEMORY (DRAM) DEVICES simplified abstract (Applied Materials, Inc.)
- 18237669. SYSTEM FOR NON RADIAL TEMPERATURE CONTROL FOR ROTATING SUBSTRATES simplified abstract (Applied Materials, Inc.)
- 18237673. ELECTROSTATIC CHUCK ASSEMBLY FOR CRYOGENIC APPLICATIONS simplified abstract (Applied Materials, Inc.)
- 18237934. METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPOR DEPOSITION PROCESSES simplified abstract (Applied Materials, Inc.)
- 18238107. METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH REDUCED DIELECTRIC CONSTANT AND HIGH MECHANICAL STRENGTH (Applied Materials, Inc.)
