US Patent Application 18448026. REPELLENT ELECTRODE FOR ELECTRON REPELLING simplified abstract
Contents
REPELLENT ELECTRODE FOR ELECTRON REPELLING
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Ching-Heng Yen of Hsinchu (TW)
Jen-Chung Chiu of Hsinchu (TW)
Tsung-Min Lin of Zhubei City (TW)
REPELLENT ELECTRODE FOR ELECTRON REPELLING - A simplified explanation of the abstract
This abstract first appeared for US patent application 18448026 titled 'REPELLENT ELECTRODE FOR ELECTRON REPELLING
Simplified Explanation
- The patent application is about a repellent electrode used in an ion implanter. - The repellent electrode has a shaft and a repellent body with a repellent surface. - The surface shape of the repellent surface matches the shape of the inner chamber space of the source arc chamber. - The gap between the edge of the repellent body and the inner sidewall of the source arc chamber is minimized to avoid a short circuit. - The purpose of the invention is to prevent a short circuit between the conductive repellent body and the conductive inner sidewall of the source arc chamber.
Original Abstract Submitted
The current disclosure is directed to a repellent electrode used in a source arc chamber of an ion implanter. The repellent electrode includes a shaft and a repellent body having a repellent surface. The repellent surface has a surface shape that substantially fits the shape of the inner chamber space of the source arc chamber where the repellent body is positioned. A gap between the edge of the repellent body and the inner sidewall of the source arc chamber is minimized to a threshold level that is maintained to avoid a short between the conductive repellent body and the conductive inner sidewall of the source arc chamber.
