US Patent Application 18362760. SEMICONDUCTOR PROCESS CHAMBER CONTAMINATION PREVENTION SYSTEM simplified abstract
Contents
SEMICONDUCTOR PROCESS CHAMBER CONTAMINATION PREVENTION SYSTEM
Organization Name
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Inventor(s)
SEMICONDUCTOR PROCESS CHAMBER CONTAMINATION PREVENTION SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18362760 titled 'SEMICONDUCTOR PROCESS CHAMBER CONTAMINATION PREVENTION SYSTEM
Simplified Explanation
The patent application describes a semiconductor process system that includes a chamber for semiconductor processing and a pump to extract gases from the chamber.
- The system includes fluid nozzles that prevent particles from flowing back into the chamber when the pump stops working.
- The fluid nozzles create a barrier of fluid within the outlet channel to block the flow of particles.
- This innovation helps maintain the cleanliness of the semiconductor process chamber and prevents contamination during the pumping process.
Original Abstract Submitted
A semiconductor process system includes a semiconductor process chamber having an interior volume. A pump extracts gases from the semiconductor process chamber via an outlet channel communicably coupled to the semiconductor process chamber. The system includes a plurality of fluid nozzles configured to prevent the backflow of particles from the outlet channel to interior volume by generating a fluid barrier within the outlet channel responsive to the pump ceasing to function.
