US Patent Application 18362480. METHOD OF AND SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
Contents
METHOD OF AND SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE
Organization Name
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Inventor(s)
Meng-Sheng Chang of Hsinchu (TW)
METHOD OF AND SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18362480 titled 'METHOD OF AND SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE
Simplified Explanation
- The patent application describes a method for designing and manufacturing a semiconductor device. - The method involves receiving a design rule deck, which includes predetermined widths and spacings for active regions. - A cell library is provided, which includes cells with active regions that adhere to the widths and spacings specified in the design rule deck. - The method involves placing two cells from the cell library in a design layout. - The first cell has a specific height and a first active region with a specific width in a certain direction. - The second cell also has the same height but a different width for its active region in the same direction. - The method concludes with the manufacturing of a semiconductor device based on the design layout.
Original Abstract Submitted
A method includes receiving a design rule deck including a predetermined set of widths and spacings associated with active regions. The method also includes providing a cell library including cells having respective active regions, wherein widths and spacings of the active regions are selected from the predetermined set of the design rule deck. The method includes placing a first cell and a second cell from the cell library in a design layout. The first cell has a cell height in a first direction, and a first active region having a first width in the first direction. The second cell has the cell height, and a second active region having a second width in the first direction. The second width is different from the first width. The method further includes manufacturing a semiconductor device according to the design layout.
